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Publikováno v:
Surface and Coatings Technology. 127:167-173
Nanolaminated titanium–titanium nitride [Ti–TiN] n structures have been deposited on silicon 〈100〉 substrates by RF reactive sputtering in order to study their mechanical properties. Structures with graded Ti/TiN (interface thickness of appro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ea24341775c8c7a68d7c893d1ad4931
https://doi.org/10.1016/s0257-8972(00)00663-0
https://doi.org/10.1016/s0257-8972(00)00663-0
