Zobrazeno 1 - 10
of 41
pro vyhledávání: '"Motofumi Komori"'
Autor:
Norikazu Takeuchi, Genna Hasegawa, Komukai Toshiaki, Takahiro Iwasaki, Masayuki Hatano, Motofumi Komori, Takuya Kono
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0eaf52485d45203b11cb61e25fb4be47
https://doi.org/10.1117/12.2657912
https://doi.org/10.1117/12.2657912
Autor:
Sachiko Kobayashi, Satoshi Mitsugi, Katsuyoshi Kodera, Kazuya Fukuhara, Anupam Mitra, Koki Ueha, Katsuya Abe, Motofumi Komori, Shingo Kanamitsu, Takuya Kono
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3eecb4501704399aea3a79e801831f0f
https://doi.org/10.1117/12.2614319
https://doi.org/10.1117/12.2614319
Autor:
Takahiro Iwasaki, Hirokazu Miyoshi, Anupam Mitra, Masayuki Hatano, Kazuya Fukuhara, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5412d1003d4912f420d0c42c2c95f46
https://doi.org/10.1117/1.jmm.21.1.011008
https://doi.org/10.1117/1.jmm.21.1.011008
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed4cd95f6738a6e1c93fd762cadb8aa2
https://doi.org/10.1117/1.jmm.21.1.011006
https://doi.org/10.1117/1.jmm.21.1.011006
Autor:
Tetsuro Nakasugi, Kazuya Fukuhara, Motofumi Komori, Soichi Inoue, Koji Hashimoto, Ryoichi Inanami
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0167dcf432fd059884a8a1ead3d60a73
https://doi.org/10.1117/1.jmm.21.1.011002
https://doi.org/10.1117/1.jmm.21.1.011002
Autor:
Motofumi Komori, Sadanori Arae, Soichi Inoue, Tetsuro Nakasugi, Koji Hashimoto, Ryoichi Inanami, Kazuya Fukuhara
Publikováno v:
Novel Patterning Technologies 2021.
We have developed Multi-Field Imprint (MFI) technology to improve the productivity of for nano-imprint lithography (NIL). Using the template having the imprinting size of 46 mm x 28 mm for MFI and the latest NIL system NZ2C (Canon Corp.), we successf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29a847384bb7e5b221b0c54f53f32148
https://doi.org/10.1117/12.2583385
https://doi.org/10.1117/12.2583385
Autor:
Hirokazu Miyoshi, Masayuki Hatano, Takahiro Iwasaki, Takuya Kono, Motofumi Komori, Mitra Anupam
Publikováno v:
Novel Patterning Technologies 2021.
Nanoimprint lithography (NIL) has been received attention as an alternative lithographic technology, which can fabricate fine patterns of semiconductor devices at low cost, by transferring fine pattern of a template on to a resist layer by physical c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8b616a0e465f34d85a2413f85089b63
https://doi.org/10.1117/12.2583676
https://doi.org/10.1117/12.2583676
Autor:
Yong-Taik Kim, Hirokazu Kato, S. Inoue, Motofumi Komori, Hirotaka Tsuda, Kei Kobayashi, A. Mitra, K. Matasunaga, Hiroshi Tokue, Sachiko Kobayashi, Masanobu Saito, Tetsuro Nakasugi, T. Imamura, Wooyung Jung, Takeharu Motokawa, Tatsuhiko Higashiki, T. Komukai, Kazuya Fukuhara, J. Cho, Masamitsu Itoh, Masayuki Hatano, K. Takahata, Shingo Kanamitsu, Takuya Kono, Kohji Hashimoto
Publikováno v:
2018 IEEE International Electron Devices Meeting (IEDM).
We developed a nanoimprint lithography (NIL) technology including NIL system, template and resist process for half pitch (hp) 14 nm direct pattering. The latest NIL system NZ2C shows the mix and match overlay (MMO) of 3.4 nm ( $3\sigma$ ) and the tem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8e744f518046f1bb7c5a2041b9f1608
https://doi.org/10.1109/iedm.2018.8614578
https://doi.org/10.1109/iedm.2018.8614578
Autor:
Motofumi Komori, Takuya Kono, Hirotaka Tsuda, Wooyung Jung, Tetsuro Nakasugi, Hirokazu Washida
Publikováno v:
Novel Patterning Technologies 2018.
Nanoimprint lithography (NIL) is regarded as one of the candidates for next generation lithography toward singlenanometer manufacturing. Among the wide variety of imprint methods, Jet and Flash Imprint Lithography (J-FIL) process is the most suitable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4121740818bee736231a0157ccf238a
https://doi.org/10.1117/12.2297332
https://doi.org/10.1117/12.2297332
Autor:
Tetsuro Nakasugi, Ji-Young Im, Kazuhiro Washida, Hirotaka Tsuda, Takuya Kono, Sachiko Kobayashi, Kyoji Yamashita, Motofumi Komori
Publikováno v:
Novel Patterning Technologies 2018.
Technologies for pattern fabrication using imprint process are being developed for various devices. Nanoimpirnt lithography (NIL) is an attractive and promising candidate for its pattern fidelity toward finer device fabrication without using double p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cf30ba4fc67be5f586b47efe20c7d6a
https://doi.org/10.1117/12.2297361
https://doi.org/10.1117/12.2297361