Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Morio Yagihara"'
Autor:
Shinichi Kanna, Morio Yagihara, Tadayoshi Kokubo, Sanjay Malik, Kazuyoshi Mizutani, Stephanie Dilocker, Shoichiro Yasunami, Shiro Tan, Yasumasa Kawabe
Publikováno v:
Journal of Photopolymer Science and Technology. 16:595-600
Resist materials for 157 nm lithography is believed to be one of the key technology for producing patterns below 70 nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some
Autor:
Morio Yagihara, Kenichiro Sato, Hajime Nakao, Kunihiko Kodama, Yasumasa Kawabe, Toshiaki Aoai
Publikováno v:
Journal of Photopolymer Science and Technology. 12:477-486
Publikováno v:
Journal of Photopolymer Science and Technology. 10:387-395
The relationship between the higher structure of resist polymers, such as novolak (NVK) and poly(hydroxystyrene) (PHS), and their alkali dissolution and dissolution inhibition characteristics were investigated. From the calculations of the polymers w
Publikováno v:
ChemInform. 23
A series of lithium tellurocarboxylates (1) were obtained as orange to red oils containing an equivalent of THF and LiCl from the reaction of acyl chlorides with lithium telluride. The salts (1) are extremely sensitive towards oxygen. Lithium benzene
Publikováno v:
Phosphorus, Sulfur, and Silicon and the Related Elements. 67:27-32
A series of lithium tellurocarboxylates (1) were obtained as orange to red oils containing an equivalent of THF and LiCl from the reaction of acyl chlorides with lithium telluride. The salts (1) are extremely sensitive towards oxygen. Lithium benzene
Autor:
Morio Yagihara, Stephanie Dilocker, Shiro Tan, Sanjay Malik, Tadayoshi Kokubo, Shinichi Kanna, Shoichiro Yasunami, Kazuyoshi Mizutani, Yasumasa Kawabe
Publikováno v:
Advances in Resist Technology and Processing XX.
Resist materials for 157nm lithography is believed to be one of the key technology for producing patterns below 70nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some o
Autor:
Yasumasa Kawabe, Kenichiro Sato, Toshiaki Aoai, Morio Yagihara, Hajime Nakao, Kunihiko Kodama
Publikováno v:
SPIE Proceedings.
Synthesis of new alicyclic (meth)acrylate polymers containing androstane moieties, especially cholic acid derivatives, and their characteristics were investigated for 193nm single layer resists. Among the derivatives, a work of adhesion, Ohnishi and
Publikováno v:
SPIE Proceedings.
A study for a new organic bottom antireflective coating (BARC) composition is described. A structural design of a light-absorbing dye was most important because dye structure not only plays a role in eliminating reflection from a substrate but also s
Publikováno v:
Chemistry Letters. 3:1015-1019
Photolytic decomposition of 2-diazophenol in methanol afforded 6-hydroxy-6-methoxy-2-(2-hydroxyphenylazo)fulvene, guaiol, phenol, and dimer of methyl cyclopentadienecarboxylate. The decomposition in water gave 6,6-dihydroxyfulvene derivative. Thermal
Publikováno v:
Bulletin of the Chemical Society of Japan. 51:2131-2135
The sensitized photooxidation of cycloheptatriene (tropilidene) in methanol afforded (4π+2π) cycloadduct; 8,9-dioxabicyclo[3.2.2]-2,6-nonadiene (1), 6-hydroxy-2,4-cycloheptadienone and 6-oxoheptadienal presumably derived from (6π+2π) cycloadduct,