Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Moran Zaberchik"'
Autor:
Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We developed a statistical method that can be applied to overlay metrology tools to improve performance and time-to-results (TTR) of multi-cycle optimization based on the brute force method. First, we evaluated full response surfaces for each combina
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40281cffdd759f39620381e8b04e1092
https://doi.org/10.1117/12.2583638
https://doi.org/10.1117/12.2583638
Autor:
Slawomir Czerkas, Ulrich Pohlmann, Richard Wang, Yoram Uziel, Nadav Gutman, Roel Gronheid, Yoel Feler, Frank Laske, Moran Zaberchik, Evgeni Gurevich, Yoav Grauer, Henning Stoschus
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We show that an overlay (OVL) metrology system based on a scanning electron microscope can achieve accurate registration of buried and resist (top) structures. The positions were determined by both Back Scattered Electrons (BSE) and Secondary Electro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b8f20ec87bdb551f74e4744aa78fea2
https://doi.org/10.1117/12.2583710
https://doi.org/10.1117/12.2583710