Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Moonjae Kwon"'
Publikováno v:
Surface and Coatings Technology. 288:163-170
The electrodeposition of Zn–Ni alloy coatings containing less than 11% Ni was performed in a sulfuric acid bath. We investigated the influence of the Ni content in the electrodeposit on the corrosion behavior of the alloy in detail, focusing mainly
Development of High Functional Black Resin Coated Electrogalvanized Steel Sheet for Digital TV Panel
Autor:
Jong-Sang Kim, Jae-Ryung Lee, Hyeon-Soop Han, Kwangsoo Lim, Moonjae Kwon, Jo Du-Hwan, Hee-Seung Kang, Myoung-Rae Cho, Jae-Hwa Lee, Yong-Gyun Jung, Pan-Woo Seon, Min-Hwan Jung, Soo-Hyoun Cho, Yon-Kyun Song, Hwon-Woo Jeong, Byoung-Chon Cho, Yeong-Bong Cho
Publikováno v:
Corrosion Science and Technology. 12:1-6
Galvanizing Department, POSCO Kwangyang Works, Kwangyang, Korea(Received November 20, 2012; Revised January 11, 2013; Accepted January 15, 2013)Recently Digital TV industry has drastically been moving the illuminating system, which causes an obvious
Autor:
Moonjae Kwon, Hokyung Park, Minseok Jo, Hyejung Choi, Seungjae Jung, Man Chang, Musarrat Hasan, Sangmoo Choi, Hyunsang Hwang
Publikováno v:
Microelectronic Engineering. 84:2002-2005
Effects of high-pressure wet vapor annealing (HPWA) on the memory properties of Metal/Alumina/Nitride/Oxide/Silicon (MANOS)-type flash memory devices are studied. The Oxide/Nitride/Alumina (ONA) stacks were annealed in a high-pressure wet vapor ambie
Autor:
Seungjae Jung, Moonjae Kwon, J. Lee, Hyejung Choi, Hokyung Park, Man Chang, Hyunsang Hwang, Musarrat Hasan
Publikováno v:
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop.
Hybrid charge trapping layer consisting of TaN nanocrystals (NCs) and silicon nitride (SiN) has been fabricated and characterized for silicon-oxide-nitride-oxide-silicon (SONOS) type nonvolatile memory device. After annealing at 900degC, TaN NCs with
Autor:
Hyejung Choi, Moonjae Kwon, Hyunsang Hwang, Hokyung Park, Musarrat Hasan, J. Lee, Seungjae Jung, Man Chang, Sangmoo Choi
Publikováno v:
Applied Physics Letters. 91:052905
TaN nanocrystals (NCs) embedded in silicon nitride were investigated as a new charge-trapping layer of a silicon-oxide-nitride-oxide-silicon-type nonvolatile memory device. After annealing at 900°C, TaN NCs with average size of 3.5nm were formed by
Publikováno v:
Applied Physics Letters. 90:193512
A nonvolatile nanocrystal (NC) memory containing a ferritin core was fabricated. A ferritin monolayer was formed through a droplet evaporation technique. High-pressure hydrogen (HP-H2) annealing effectively reduced iron oxide (Fe2O3) to form conducti
Autor:
Seungyeol Oh, Rui Dong, Minseok Jo, Wenfeng Xiang, Daeseok Lee, Musarrat Hasan, Moonjae Kwon, Hyejung Choi, Man Chang, Dong-jun Seong, Hyunsang Hwang, Sungho Heo
Publikováno v:
Applied Physics Letters. 90:182118
Materials showing reversible resistance switching between high-resistance state and low-resistance state at room temperature are attractive for today’s semiconductor technology. In this letter, the improvement of reproducible hysteresis and resisti
Autor:
Hyejung Choi, Rui Dong, S. N. Seo, Musarrat Hasan, Daeseok Lee, Seungyeol Oh, Wenfeng Xiang, M. B. Pyun, Dong-jun Seong, Hyunsang Hwang, Sungho Heo, Moonjae Kwon
Publikováno v:
Applied Physics Letters. 90:042107
Materials showing reversible resistance switching between high-resistance state and low-resistance state at room temperature are attractive for today’s semiconductor technology. In this letter, the reproducible hysteresis and resistive switching ch
Autor:
Hyejung Choi, Seung-Jae Jung, Hokyung Park, Joon-Myung Lee, Moonjae Kwon, Man Chang, Hasan, M., Hyunsang Hwang
Publikováno v:
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop; 2007, p73-74, 2p