Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Moon-Gyu Sung"'
This article considers the nanomanufacturing of hybrid devices using the self-assembly strategy. Hybrid devices utilize nanomaterials such as nanoparticles, organic molecules, carbon nanotubes (CNTs), and nanowires. Examples include CNT-based circuit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03bfefc8fbf07e6853c6dc748502e8b9
https://doi.org/10.1093/oxfordhb/9780199533060.013.10
https://doi.org/10.1093/oxfordhb/9780199533060.013.10
Autor:
Sunae Seo, Kwang Heo, Hyungwoo Lee, David H. Seo, Seunghun Hong, Moon Gyu Sung, Taekyeong Kim, Kyung-Eun Byun
Publikováno v:
ACS Nano. 5:8620-8628
We developed a scanning noise microscopy (SNM) method and demonstrated the nanoscale noise analysis of a graphene strip-based device. Here, a Pt tip made a direct contact on the surface of a nanodevice to measure the current noise spectrum through it
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca071e7286b78577f51eab368ee90c5d
https://doi.org/10.1021/nn202135g
https://doi.org/10.1021/nn202135g
Autor:
Byeongju Kim, Jung Hoon Bak, Yun Daniel Park, Kwang Heo, Moon Gyu Sung, Jiwoon Im, Seunghun Hong, Byung Yang Lee
Publikováno v:
Carbon. 49:2549-2554
There have been extensive efforts to improve the properties of conventional metals such as electrical conductivity and rigidity. Here, we report a massive fabrication strategy for metal–carbon nanotube (CNT) laminate-based electrodes. In this metho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9c0752721e597a38ad51869a4cf6a6d
https://doi.org/10.1016/j.carbon.2011.02.044
https://doi.org/10.1016/j.carbon.2011.02.044
Autor:
Seunghun Hong, Young-Kyun Kwon, Moon Sook Lee, Moon Gyu Sung, Ku Youn Baik, Byung Yang Lee, Joohyung Lee
Publikováno v:
ACS Nano. 5:4373-4379
Carbon nanotube (CNT) network-based sensors have been often considered unsuitable for practical applications due to their unpredictable characteristics. Herein, we report the study of universal parameters which can be used to characterize CNT network
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c3fc3fb95b0bdb91e9c77f6de66b6ced
https://doi.org/10.1021/nn103056s
https://doi.org/10.1021/nn103056s
Autor:
Seunghun Hong, Dong Shin Choi, Sung Young Park, Hyungwoo Lee, Moon Gyu Sung, Seon Namgung, Byung Yang Lee
Publikováno v:
NPG Asia Materials. 2:103-111
Although advanced devices based on nanotubes (NTs) and nanowires (NWs) are drawing much attention, devices based on a single NT or NW are not suitable for general manufacturing purposes, as it is still extremely difficult to control the electronic pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f44ecb8da52f85f9d0ed541abac69c3e
https://doi.org/10.1038/asiamat.2010.83
https://doi.org/10.1038/asiamat.2010.83
Autor:
Jong Rak Park, Sung-Woon Choi, Moon-Gyu Sung, Ji-Hyun Choi, Jin-Tae Kim, Hyun Su Kim, Won-Il Cho
Publikováno v:
ETRI Journal. 27:188-194
We report on the improvement of critical dimension (CD) linearity on a photomask by applying the concept of process proximity correction to a laser lithographic process used for the fabrication of photomasks. Rule-based laser process proximity correc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f674d0c55f7e9dd97a9faa2ec08400a0
https://doi.org/10.4218/etrij.05.0104.0077
https://doi.org/10.4218/etrij.05.0104.0077
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 26(3)
We report a direct deposition strategy for sub-50-nm-scale uniform Au patterns on virtually any general insulating substrate via dip-pen nanolithography (DPN). In that process, HAuCl(4) molecules were deposited onto bare insulating substrates via a m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f41ab80f40bf0a2719f89d95e7a2bdd0
https://pubmed.ncbi.nlm.nih.gov/20041677
https://pubmed.ncbi.nlm.nih.gov/20041677
Publikováno v:
SPIE Proceedings.
The shrink of device node to 65 and 45nm node masks mask manufacturers paying their attention to repair process in terms of mask cost efficiency. Thus, it is very important to define the repair performance accurately and introduce adequate tools time
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e042a9ca3fa75c20429d58eab2c00d4e
https://doi.org/10.1117/12.686509
https://doi.org/10.1117/12.686509
Autor:
Won-Il Cho, Seong-Woon Choi, Moon-Gyu Sung, Won-Suk Ahn, Jung-Min Sohn, Hee-Sun Yoon, Sung-Yong Cho, Seong-Yong Moon
Publikováno v:
SPIE Proceedings.
As the design rule of lithography becomes smaller, printability of reticle defect to wafer is critical for the photomask manufacturing technology. In order to improve the controllability of reticle defects, inspection and repair systems are expanding
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d638b43e20c9e54da35d78eeded7560
https://doi.org/10.1117/12.504055
https://doi.org/10.1117/12.504055
Publikováno v:
SPIE Proceedings.
Haze is a kind of surface contamination on photomask and lithography optics that made by photochemical reaction. There are many problems in photomask manufacturing, inspection and lithography process because of slowly growing feature of haze. In the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::956374e7015f34261dda60f36a4243af
https://doi.org/10.1117/12.504277
https://doi.org/10.1117/12.504277