Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Moon-Gyu Jeong"'
Publikováno v:
2022 6th International Conference on Electric Power Equipment - Switching Technology (ICEPE-ST).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bffb0dbff2e378221b523fc41ea1cb9d
https://doi.org/10.1109/icepe-st51904.2022.9757071
https://doi.org/10.1109/icepe-st51904.2022.9757071
Publikováno v:
IEEE Transactions on Power Delivery. 33:2901-2909
A current sampled signal in a faulted transmission line can contain multiple dc components, namely a primary decaying dc component (DDC), a secondary DDC, an auxiliary DDC, and a bias DDC, and these may be due to a faulted line, current transformer,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62befaa2c95332928760e2cf31d6b0df
https://doi.org/10.1109/tpwrd.2018.2825257
https://doi.org/10.1109/tpwrd.2018.2825257
Publikováno v:
IJIREEICE. 5:1-10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0037bd6204014888effaf4697894db21
https://doi.org/10.17148/ijireeice.2017.5501
https://doi.org/10.17148/ijireeice.2017.5501
Publikováno v:
The Transactions of The Korean Institute of Electrical Engineers. 64:1281-1287
We report the characteristics and differences of two types of attenuation measurement methods for electromagnetic partial discharge signal in GIS. The pulse method is to measure the attenuated waveforms in time domain and coverts them into frequency
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d68db4ab425bfb7774f0f0dc341eef81
https://doi.org/10.5370/kiee.2015.64.9.1281
https://doi.org/10.5370/kiee.2015.64.9.1281
Autor:
Jae W. Hahn, Moon-Gyu Jeong
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 16:1
Circuit design is driven to the physical limit, and thus patterns on a wafer suffer from serious distortion due to the optical proximity effect. Advanced computational methods have been recommended for photomask optimization to solve this problem. Ho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::58f491328c6c714f23e43fe705d53a24
https://doi.org/10.1117/1.jmm.16.4.043504
https://doi.org/10.1117/1.jmm.16.4.043504
Autor:
Moon-Gyu Jeong, Jae W. Hahn
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:013509
Most approaches to model-based optical proximity correction (OPC) use an iterative algorithm to determine the optimum mask. Each iteration requires at least one simulation, which is the most time-consuming part of model-based OPC. As the layout becom
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::820f18c40a21915c2881d97aa5748ed1
https://doi.org/10.1117/1.jmm.15.1.013509
https://doi.org/10.1117/1.jmm.15.1.013509
Publikováno v:
2012 IEEE Vehicle Power and Propulsion Conference.
This paper is about ‘how to perform the test of 'EV (Electric Vehicle) quick charger’ with the help of the newly developed test equipment and procedure. The quick charger delivers maximum DC power to EV, within the range of battery tolerance, in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cef16391ad1fa79001df4fe5c3946819
https://doi.org/10.1109/vppc.2012.6422590
https://doi.org/10.1109/vppc.2012.6422590
Autor:
Won-Chan Lee, Seong-Woon Choi, Young-Hee Kim, Young-Chang Kim, Chun-Suk Suh, Seung-Hune Yang, Seongbo Shim, Moon-Gyu Jeong, Sung-Hoon Jang
Publikováno v:
SPIE Proceedings.
Generally speaking, the models used in the optical proximity effect correction (OPC) can be divided into three parts, mask part, optic part, and resist part. For the excellent quality of the OPC model, each part has to be described by the first princ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::668a96546a1e910ef8bc71a7799a45f6
https://doi.org/10.1117/12.879604
https://doi.org/10.1117/12.879604
Autor:
Donghwan Son, Tom Cecil, Sung-Gon Jung, Moon-Gyu Jeong, Sung-Woo Lee, Xin Zhou, Woojoo Sim, Robert E. Gleason, Junghoon Ser, Lan Luan, Seoung-woon Choi, David Kim
Publikováno v:
SPIE Proceedings.
For semiconductor IC manufacturing at sub-30nm and beyond, aggressive SRAFs are necessary to ensure sufficient process window and yield. Models used for full chip Inverse Lithography Technology (ILT) or OPC with aggressive SRAFs must predict both CDs
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80ba331cf6dad07f964f3842e6b786e1
https://doi.org/10.1117/12.864528
https://doi.org/10.1117/12.864528
Autor:
Tae-Hoon Park, Chan-Hoon Park, Joo-Tae Moon, Seong-Woon Choi, Eun-Mi Lee, Junghoon Ser, Sung-Woo Lee, Chun-Suk Suh, Moon-Gyu Jeong
Publikováno v:
SPIE Proceedings.
OPC models with and without thick mask effect (3D-mask effect) are compared in their prediction capabilities of actual 2D patterns. We give some examples in which thin-mask models fail to compensate the 3D-mask effect. The models without 3D-mask effe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c9e3ee67be005c06b7128462ae29ae0
https://doi.org/10.1117/12.848317
https://doi.org/10.1117/12.848317