Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Mookkan Periyasamy"'
Autor:
Mookkan Periyasamy, AA Mubasshir, Stiven Kodra, Sangeetham Chandramouli, Ronald Campbell, David O. Kazmer, Joey L. Mead
Publikováno v:
Micromachines, Vol 15, Iss 5, p 622 (2024)
This work investigated material extrusion additive manufacturing (MatEx AM) of specialized fluoroelastomer (FKM) compounds for applications in rubber seals and gaskets. The influence of a commercially available perfluoropolyether (PFPE) plasticizer o
Externí odkaz:
https://doaj.org/article/ea1ed47218374c939307ed789e624139
Autor:
Mookkan Periyasamy, Ronald Campbell, Joey M. Mead, David O. Kazmer, ShibShankar Banerjee, AA Mubasshir, Leeda A. Phaen, Stiven Kodra
Publikováno v:
Micromachines, Vol 15, Iss 5, p 582 (2024)
In this work, an additive manufacturing process for extruding fully compounded thermosetting elastomers based on fluorine-containing polymer compositions is reported. Additive manufacturing printers are designed with a dry ice container to precool fi
Externí odkaz:
https://doaj.org/article/37ec51a0e52a4fa6b62a86e14a60f4b2
Publikováno v:
Sensors, Vol 23, Iss 3, p 1342 (2023)
Operators of industrial machinery relentlessly pursue improving safety, increasing productivity, and minimizing unplanned downtime. Elastomer seals are ubiquitous components of this machinery. In general, static seals are designed to be compressed at
Externí odkaz:
https://doaj.org/article/608901178b4c40c29277fd5e5fbe780a
Publikováno v:
Journal of Composite Materials. 56:4409-4419
Additive manufacturing (AM) methods such as fused filament fabrication (FFF) and direct ink writing (DIW) enable the free-form design and printing of complex architectures using a range of materials. Compared with traditional manufacturing technologi
Publikováno v:
Polymer Engineering & Science.
Autor:
Mookkan Periyasamy
Publikováno v:
202nd Technical Meeting of the Rubber Division, ACS (IEC 2022).
Autor:
Suresh K. Sitaraman, R.C. Dunne, C.P. Wong, William E. Estes, Mookkan Periyasamy, Shijian Luo
Publikováno v:
Journal of Applied Polymer Science. 84:691-700
The cure kinetics of a photodielectric dry film (PDDF) material called ViaLux 81 has been studied, with the aim of understanding and optimizing its curing schedule for the fabrication of sequentially built-up (SBU) high-density-interconnect printed w
Autor:
Jerald Feldman, Susan M. Holl, Roger H. French, Fredrick Claus Zumsteg, Mookkan Periyasamy, Robert J. Smalley, Roderick R. Kunz, Veena Rao, Michael Crawford, Ling Liao, Andrew Edward Feiring, Frank Leonard Schadt
Publikováno v:
Advances in Resist Technology and Processing XVII.
The design ofan organic material satisfying all ofthe requirements for a single layer photolithography resist at 157 nm is aformidable challenge. All known resists used for optical lithography at 193 nm or longer wavelengths are too highlyabsorbing a
Autor:
T. Balakrishnan, Mookkan Periyasamy
Publikováno v:
Journal of Polymer Science: Polymer Chemistry Edition. 20:1885-1897
This article describes a new, spontaneous, 1:1 alternating copolymerization between a Schiff base, N-benzylidine aniline (NBA), and α-haloacrylic acids (XAA) such as α-chloroacrylic acid (ClAA) and α-bromoacrylic acid (BrAA). The structure of the
Autor:
T. Balakrishnan, Mookkan Periyasamy
Publikováno v:
Polymer. 23:1372-1376
New 1:1 alternating copolymers of 2-methyl-2-oxazoline with (i) α-chloroacrylic acid and (ii) α-bromoacrylic acid were synthesized and characterized by i.r., n.m.r. and the products of alkaline hydrolysis. The copolymerization occurred at a tempera