Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Monica Sears"'
Autor:
Ana-Maria Armeanu, Evgeny Malankin, Neal Lafferty, Chih-I Wei, Monica Sears, Germain Fenger, Xima Zhang, Werner Gillijns, Darko Trivkovic, Ryan Ryoung-Han Kim, Jeonghoon Lee
Publikováno v:
DTCO and Computational Patterning II.
Single mask solution to pattern BLP and SNLP using 0.33NA EUV for next-generation DRAM manufacturing
Autor:
Kaushik Sah, Andrew Cross, Sayantan Das, Roberto Fallica, Jeonghoon Lee, Ryan Ryoung Kim, Sandip Halder, Ethan Maguire, Ana-Maria Armeanu, Monica Sears, Neal Lafferty, Vlad Liubich, Chih-i Wei, Germain Fenger
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.