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pro vyhledávání: '"Monica Laurel Kempsell"'
Autor:
Geert Vandenberghe, Eric Hendrickx, Bruce W. Smith, Kyohei Sakajiri, Monica Laurel Kempsell, Susuki Yoshitake, Yuri Granik, Alexander Tritchkov, Kenichi Yasui
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:043001
Inverse lithography technology (ILT) is a procedure that optimizes the mask layout to produce an image at the wafer with the targeted aerial image. For an illumination condition optimized for dense pitches, ILT inserts model-based subresolution assis
Autor:
Monica Laurel Kempsell, Eric Hendrickx, Alexander Tritchkov, Kyohei Sakajiri, Kenichi Yasui, Susuki Yoshitake, Yuri Granik, Geert Vandenberghe, Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Oct2009, Vol. 8 Issue 4, p043001-043001-9, 1p