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Autor:
Matteo Cialone, Monica Fernandez-Barcia, Federica Celegato, Marco Coisson, Gabriele Barrera, Margitta Uhlemann, Annett Gebert, Jordi Sort, Eva Pellicer, Paola Rizzi, Paola Tiberto
Publikováno v:
Science and Technology of Advanced Materials, Vol 21, Iss 1, Pp 424-434 (2020)
Sputtering and electrodeposition are among the most widespread techniques for metallic thin film deposition. Since these techniques operate under different principles, the resulting films typically show different microstructures even when the chemica
Externí odkaz:
https://doaj.org/article/ce68da4b4a144998a75af84ccb514920