Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Momtchil Stavrev"'
Autor:
Werner Graf, Markus Schardin, Hans-Peter Sperlich, Ines Uhlig, Arabinda Das, Momtchil Stavrev, Heike Prenz
Publikováno v:
Microelectronic Engineering. 85:2085-2088
The goal of this work is to find a substitute for chemically-vapour-deposited (CVD) Borophosphosilicate glass (BPSG), which is currently used as a pre-metal dielectric (PMD) for sub 50nm. Two spin-on candidates are considered, out of which one contai
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b4075539529d6f397c02df3e751e9fa
https://doi.org/10.1016/j.mee.2008.04.002
https://doi.org/10.1016/j.mee.2008.04.002
Autor:
Ulrich Egger, Matthias Markert, Alessia Scire, Ralf Koepe, Kevin A. Pears, Momtchil Stavrev, Lee Donohue
Publikováno v:
Microelectronic Engineering. 81:156-161
Carbon hard mask structures have been used to etch a variety of materials typically used in sub 90nm DRAM manufacture. The results indicate that carbon hard masks can be used very effectively to structure oxide, nitride and metal films giving the CD
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c97e36cfbe65198a48d55eda4716bc7e
https://doi.org/10.1016/j.mee.2005.05.002
https://doi.org/10.1016/j.mee.2005.05.002
Autor:
Audrey Beckert, Werner Graf, Kristin Schupke, Clemens Fitz, Sven Schmidbauer, Ines Thuemmel, Momtchil Stavrev
Publikováno v:
Microelectronic Engineering. 85:2025-2027
Conventional DRAM contact to Si cleaning methods are using wet HF-based chemistry to remove the native SiO"2 from the contact bottom and reduce the contact resistance [M.R. Baklanov, et al., J. Electrochem. Soc. 145 (9) (1998) 3240-3246]. With furthe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df778857bd8a5b6feb68f5339878c5e3
https://doi.org/10.1016/j.mee.2008.07.011
https://doi.org/10.1016/j.mee.2008.07.011
Autor:
Stavrev, M., Scire, A., Vogt, M., Klingbeil, P., Chun-Cheng Liao, Gruss, S., Froehlich, H.-G., Mothes, K., Bauch, L., Wege, S., Thyssen, N.
Publikováno v:
2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference & Workshop (IEEE Cat. No.04CH37530); 2004, p84-88, 5p
Autor:
Pauliac-Vaujour, S., Comboroure, C., Vizioz, C., Barnola, S., Brianceau, P., Alvaro, V. Maffini, Dupré, C., Ernst, T.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Nov2008, Vol. 26 Issue 6, p2583-2586, 4p, 8 Black and White Photographs, 1 Diagram, 1 Graph