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Autor:
Arie Jeffrey Den Boef, Justin Huang, Jeff Lin, Frank Sun, Matthew McLaren, Edison Wang, Farzad Farhadzadeh, Momo Lin, Kaustuve Bhattacharyya, Wilson Liu, Jason Hung, Marc Noot, Benny Gosali, Ken Chang, Cathy Wang, Sax Liao, Simon Gijsbert Josephus Mathijssen
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
An after etch overlay measurement on device is typically used as a reference overlay as this is what determines the final overlay. The delta between on target overlay from after develop (ADI) and this reference overlay on device after etch (AEI) is k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8981325562d805f21c4d5d02db2a3ad5
https://doi.org/10.1117/12.2583861
https://doi.org/10.1117/12.2583861
