Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Mitsuru Uda"'
Autor:
Mitsuru Uda, Takashi Tsunoda, Masaharu Fujimoto, Teruya Kashiwagi, Keisuke Okumura, Makoto Nakamura, Maeda Tetsuya
Publikováno v:
Organic Process Research & Development. 8:915-919
Strategies that were adopted during the process development of Cefotetan in order to achieve a cost-effective commercial-scale synthesis are described herein. These included replacement of the trif...
Autor:
Chandrasekhar Narayan, Eugene Stewart Schlig, Kenneth C. Ho, Kunio Enami, Evan G. Colgan, Raminderpal Singh, Fuad E. Doany, Derek B. Dove, J. L. Sanford, Kei-Hsiung Yang, Paul Matthew Alt, Alan E. Rosenbluth, Robert Lee Melcher, Thomas Mario Cipolla, Mitsuru Uda, Robert Stephen Olyha, Istvan Lovas, Carl G. Powell, T. Tomooka
Publikováno v:
IBM Journal of Research and Development. 42:321-338
A prototype 28-in.-diagonal desktop data monitor capable of displaying 2048 × 2048- pixel images has been designed, built, and evaluated. The monitor uses optical projection technology. A reflective, crystalline silicon active-matrix light valve usi
Autor:
Atsushi Kohayase, Tohru Sasaki, Kunihiko Hikichi, Dai Sugimoto, Nozomu Izumi, Hiroshi Yamashita, Mitsuru Uda
Publikováno v:
SPIE Proceedings.
An in-line image quality monitoring system using automated macro-inspection is described. One of the critical problems in reducing yield in CCD manufacture is the production of mura, regions of uneven sensitivity in the device. In this paper, an in-l
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29:06FC02
Nanoimprint lithography (NIL) is a very useful technique for the fabrication of nanopatterns, and it is used in some practical applications. The key issue for mass production is the understanding of the lifetime and deterioration of the release coati
Autor:
M. Lu, Kei-Hsiung Yang, T. Tomooka, Masami Shinohara, T. Tsukamoto, Mitsuru Uda, Evan G. Colgan, Alan E. Rosenbluth, Fuad E. Doany
Publikováno v:
SID Symposium Digest of Technical Papers. 29:1071
A mirror structure for reflective Si based light valves was fabricated using chemical mechanical polishing and a thin 150 nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical-mechanical polishing planarization resulted in only a 1%