Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Mitsuru Kekura"'
Autor:
Miura Toshinori, Kameda Naoto, Yoshiki Morikawa, Hidehiko Nonaka, Mitsuru Kekura, Ken Nakamura
Publikováno v:
Vacuum and Surface Science. 62:433-438
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93a01f674dcd582f55eb3b67e55bf855
https://doi.org/10.1380/vss.62.433
https://doi.org/10.1380/vss.62.433
Autor:
Tomoharu Ushiyama, Tetsuya Nishiguchi, Naoto Kameda, Yoshiki Morikawa, Ken Nakamura, Hidehiko Nonaka, Shingo Ichimura, Mitsuru Kekura
Publikováno v:
Analytical Sciences. 26:273-276
Using ultraviolet (UV)-excited ozone gas, we prepared high-quality SiO(2) films that can be used as gate dielectric films on poly-silicon or silicon wafers without sample heating. The UV-excited ozone gas was generated by UV irradiation of highly con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d25b7c5b53fc8ab90cd620b9ad316b28
https://doi.org/10.2116/analsci.26.273
https://doi.org/10.2116/analsci.26.273
Autor:
Naoto Kameda, Tomoharu Ushiyama, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Shingo Ichimura, Hidehiko Nonaka
Publikováno v:
Journal of the Vacuum Society of Japan. 53:230-233
SiO2 film was made on Si(100) by two-step film growth process at 100°C to improve the interface properties. The first part of the process is the direct Si oxidation using UV-excited ozone (O(1D)), which is generated by the UV irradiation to high con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5598fbfe8ee69315a46e48ecd6f07c85
https://doi.org/10.3131/jvsj2.53.230
https://doi.org/10.3131/jvsj2.53.230
Publikováno v:
Journal of Photopolymer Science and Technology. 21:311-316
New processing technologies are demanded which produce hyperfine structures for electronic devices and which do not exacerbate environmental problems. We specifically examined photoresist removal technology for this study. Ozone gas of nearly 100% co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::454c3a59e7b059f1c66246863ea5d058
https://doi.org/10.2494/photopolymer.21.311
https://doi.org/10.2494/photopolymer.21.311
Autor:
Shigeru Saito, Tetsuya Nishiguchi, Naoto Kameda, Yoshiki Morikawa, Shingo Ichimura, Hidehiko Nonaka, Mitsuru Kekura
Publikováno v:
Journal of the Vacuum Society of Japan. 51:228-231
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e55b7981a91a1b50784fdac62693b76
https://doi.org/10.3131/jvsj2.51.228
https://doi.org/10.3131/jvsj2.51.228
Autor:
Yoshiki Morikawa, Shingo Ichimura, Shigeru Saitoh, Tetsuya Nishiguchi, Naoto Kameda, Mitsuru Kekura, Hidehiko Nonaka
Publikováno v:
Japanese Journal of Applied Physics. 46:2835-2839
A low-temperature, damage-free process for growing ultrathin (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::109d18259e53ca4a5754a549ee0473c3
https://doi.org/10.1143/jjap.46.2835
https://doi.org/10.1143/jjap.46.2835
Autor:
Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa, Takeshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura
Publikováno v:
Shinku. 48:313-316
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8d02708e035a129bdaf750b8d662a7e
https://doi.org/10.3131/jvsj.48.313
https://doi.org/10.3131/jvsj.48.313
Autor:
Yoshiki Morikawa, Shingo Ichimura, Tetsuya Nishiguchi, Hidehiko Nonaka, Noyori Tsuyoshi, Mitsuru Kekura
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1410-1414
A system is described which can continuously generate/supply highly concentrated (HC) ozone gas to satisfy the future need for practical low-temperature oxidation. This system comprises four ozone vessels, each with independent temperature control. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a5cecedc5702472b56a7e507aae66fa
https://doi.org/10.1116/1.1705592
https://doi.org/10.1116/1.1705592
Autor:
Yoshiki Morikawa, Shingo Ichimura, Masaharu Miyamoto, Hidehiko Nonaka, Mitsuru Kekura, Tetsuya Nishiguchi
Publikováno v:
Review of Scientific Instruments. 73:1217-1223
A reactive oxygen beam generation system is described for the formation of high-quality and high-precision films. This system utilizes pulsed laser evaporation of highly concentrated solidified ozone (O3). The equipment for safely generating and hand
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2abff5e86175a75732b7cff707d1645
https://doi.org/10.1063/1.1448909
https://doi.org/10.1063/1.1448909
Autor:
Shingo Ichimura, Yoshiki Morikawa, Tetsuya Nishiguchi, Naoto Kameda, Mitsuru Kekura, Hidehiko Nonaka
Publikováno v:
Journal of the Vacuum Society of Japan. 52:245-247
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc79d04d64177c6fe7d8a329e8577ce7
https://doi.org/10.3131/jvsj2.52.245
https://doi.org/10.3131/jvsj2.52.245