Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Mitsuo Yabuta"'
Autor:
Tsutomu Saito, Mitsuo Yabuta
Publikováno v:
Japanese journal of applied entomology and zoology. 40:71-76
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef2ffe8f4cdf872b1e059fa229cf9fa7
https://doi.org/10.1303/jjaez.40.71
https://doi.org/10.1303/jjaez.40.71
Autor:
Susumu Namba, Minoru Tsuda, Setsuko Oikawa, Mitsuo Yabuta, Kenjj Gamo, Hisashi Nakane, Nobufumi Atoda, Koichiro Hoh, Akira Yokota
Publikováno v:
Polymer Engineering and Science. 26:1148-1152
Dry developable resists comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-dI-(4′-azldoben-zylidene)-cyclohexanone-1 gave excellent results in SK lithography, i. e., high aspect ratio resist patterns with vertical walls were easi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfb8e2ab415cc4dc92ab343ff5ca7d5b
https://doi.org/10.1002/pen.760261615
https://doi.org/10.1002/pen.760261615
Autor:
Setsuko Oikawa, Wataru Kanai, Mitsuo Yabuta, Minoru Tsuda, Ken-ichi Kashiwagi, Isamu Hijikata, Hisashi Nakane, Akira Yokota
Publikováno v:
Polymer Engineering and Science. 23:993-999
A dry developable negative working resist composition comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-di(4′-azido-benzylidene) cyclohexanone-1 was examined. The main photochemical product formed in the resist pattern was found
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a13aa76001235a812bd78df8eedee7cc
https://doi.org/10.1002/pen.760231804
https://doi.org/10.1002/pen.760231804
Publikováno v:
SPIE Proceedings.
We have developed ,a water-soluble contrast enhancing material, TAD-436 ( Tokyo Ohka. Anti-Defocus Material ) which is consisted of a water-soluble diazonium salt as bleaching compounds and a water-soluble anion type polymer as binder polymers. Needl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30e8e4eb5beb8ea910cf79e282b6ad25
https://doi.org/10.1117/12.975603
https://doi.org/10.1117/12.975603
Publikováno v:
Chemistry Letters. 11:591-592
The distribution equilibrium of gallium(III) between aqueous sodium hydroxide solutions and solutions of 7-(5,5,7,7-tetramethyl-1-octen-3-yl)-8-hydroxyquinoline (KELEX 100) in kerosene has been examined under different conditions. As a result, it is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e982e750ac39773fd06626effcc43294
https://doi.org/10.1246/cl.1982.591
https://doi.org/10.1246/cl.1982.591
Autor:
Nobufumi Atoda, Minoru Tsuda, Setsuko Oikawa, Hisashi Nakane, A. Yokota, Mitsuo Yabuta, Koichiro Hoh
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 4:256
The examination of synchrotron radiation (SR) lithography of a dry developable negative resist comprising poly(methylisopropenylketone) and 2,6‐di (4’‐azidobenzylidene)‐4‐methylcyclo hexanone‐1 was carried out using the facilities of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::932d061ac03837e2511d2bb5b710e342
https://doi.org/10.1116/1.583452
https://doi.org/10.1116/1.583452
Autor:
Hisashi Nakane, Wataru Kanai, Minoru Tsuda, Ken-ichi Kashiwagi, Setsuko Oikawa, Akira Yokota, Mitsuo Yabuta
Publikováno v:
Japanese Journal of Applied Physics. 22:1215
A dry developable resist composition which gives a steep profile pattern and high-remaining resist thickness (ca. 90%) is described. The composition comprises poly (methyl isopropenyl ketone), PMIPK, and 4,4'-diazidodiphenyl sulfone. The resist patte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::266b64a165d1e98f5b9479d9f363e9af
https://doi.org/10.1143/jjap.22.1215
https://doi.org/10.1143/jjap.22.1215
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