Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Mitsuhito Suwa"'
Publikováno v:
Journal of Photopolymer Science and Technology. 34:517-524
Publikováno v:
Journal of Photopolymer Science and Technology. 33:569-572
Publikováno v:
Journal of Photopolymer Science and Technology. 32:665-669
Publikováno v:
Journal of Photopolymer Science and Technology. 32:485-488
Publikováno v:
Journal of Vacuum Science & Technology B. 40:022602
Positive photosensitive materials prepared by adding a diazonaphthoquinone (DNQ) derivative to matrices of oligomeric silsesquioxanes (oligo-SQs) with random structures, including only a phenyl (Ph) substituent or both Ph and methyl (Me) substituents
Publikováno v:
Japanese Journal of Applied Physics. 60:051002
Oligomeric silsesquioxanes (Oligo-SQs) with random structures featuring phenyl (Ph) groups or both Ph and methyl (Me) groups as their substituents were synthesized by the sol–gel method. The ratio of Ph and Me groups controlled the molecular weight
Publikováno v:
Journal of Photopolymer Science and Technology. 25:349-353
Publikováno v:
High Performance Polymers. 23:66-73
A novel high refractive index positive-tone photosensitive polyimide (posi-PSPI) has been successfully developed. The posi-PSPI has a refractive index of 1.78 at 633 nm and good transparency (> 80% at 400 nm). It is prepared from an alkali—soluble
Publikováno v:
Journal of Photopolymer Science and Technology. 16:221-226
Publikováno v:
Journal of Photopolymer Science and Technology. 13:357-360