Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Mitsuhiro Omura"'
Autor:
Shogo Tokumaru, Takahama T, Yukitsuna Eshita, Koichiro Kubo, Kei Hasegawa, Takaaki Saito, Naoshi Minamidate, Misako Okabayashi, Shosuke Hosaka, Mitsuhiro Omura, Yoshihiro Morimoto, Kiyotaka Umeki, Shin-ichiro Sato, Masaaki Hamada
Publikováno v:
Suizo. 30:663-670
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70d047fd527798faa699fe02c7f71fc4
https://doi.org/10.2958/suizo.30.663
https://doi.org/10.2958/suizo.30.663
Autor:
Masahiro Kanno, Hiroki Yonemitsu, Mitsuhiro Omura, Hironobu Sato, Ayako Kawanishi, Tsukasa Azuma, Yuriko Seino, Tsubasa Imamura, Naofumi Nakamura, Hirokazu Kato, Katsutoshi Kobayashi
Publikováno v:
Journal of Photopolymer Science and Technology. 27:7-10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::faaf52dc24feee92d79bd705dd05161f
https://doi.org/10.2494/photopolymer.27.7
https://doi.org/10.2494/photopolymer.27.7
Autor:
Daisuke Ogawa, Mitsuhiro Omura, Taku Iwase, Haruka Suzuki, Shota Nunomura, Yasushi Sonoda, Kazuo Takahashi, Nobuyuki Kuboi, Takayoshi Tsutsumi, Kenji Ishikawa, Yoshito Kamaji, Tomohiro Nozaki, Kenichi Yoshikawa, Tetsuji Shimizu, Kazunori Shinoda, Nobuyuki Negishi, Tatsuo Ishijima, Song-Yun Kang, Moritaka Nakamura, Kazunori Koga
Publikováno v:
Japanese Journal of Applied Physics. 58:SE0802
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a28c5de3aa52c38eb6a14b04df3a8b83
https://doi.org/10.7567/1347-4065/ab1638
https://doi.org/10.7567/1347-4065/ab1638
Autor:
Moritaka Nakamura, Kazunori Koga, Kazunori Shinoda, Shota Nunomura, Yoshito Kamaji, Yasushi Sonoda, Kazuo Takahashi, Kenichi Yoshikawa, Tomohiro Nozaki, Song-Yun Kang, Kenji Ishikawa, Daisuke Ogawa, Takayoshi Tsutsumi, Nobuyuki Kuboi, Tatsuo Ishijima, Tetsuji Shimizu, Taku Iwase, Haruka Suzuki, Mitsuhiro Omura, Nobuyuki Negishi
Publikováno v:
Japanese Journal of Applied Physics. 58:SE0803
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efbf09f1ecb1c0c21b5c261c1b3664c4
https://doi.org/10.7567/1347-4065/ab163a
https://doi.org/10.7567/1347-4065/ab163a
Autor:
Daisuke Ogawa, Tomohiro Nozaki, Tatsuo Ishijima, Moritaka Nakamura, Kazunori Koga, Kazunori Shinoda, Song-Yun Kang, Taku Iwase, Haruka Suzuki, Kazuo Takahashi, Nobuyuki Negishi, Takayoshi Tsutsumi, Nobuyuki Kuboi, Shota Nunomura, Kenichi Yoshikawa, Kenji Ishikawa, Mitsuhiro Omura, Yoshito Kamaji, Tetsuji Shimizu, Yasushi Sonoda
Publikováno v:
Japanese Journal of Applied Physics. 58:SE0804
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12565654c5a83e394ccbf6a5132b52d8
https://doi.org/10.7567/1347-4065/ab163b
https://doi.org/10.7567/1347-4065/ab163b
Autor:
Naofumi Nakamura, Hirokazu Kato, Hironobu Sato, Katsutoshi Kobayashi, Tsubasa Imamura, Yuriko Seino, Hiroki Yonemitsu, Ayako Kawanishi, Masahiro Kanno, Tsukasa Azuma, Mitsuhiro Omura
Publikováno v:
Microelectronic Engineering. 110:152-155
In this study, sub-30nm via interconnects were fabricated and fully integrated on a 300mm wafer using directed self-assembly lithography (DSAL). They were tested electrically and initial test results are reported. DSAL was applied on the via layer, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::53f5115333b82736bdf8c8690bb59dde
https://doi.org/10.1016/j.mee.2013.03.025
https://doi.org/10.1016/j.mee.2013.03.025
Autor:
Tsubasa Imamura, Tsukasa Azuma, Hiroki Yonemitsu, Yuriko Seino, Mitsuhiro Omura, Masahiro Kanno, Naofumi Nakamura, Katsutoshi Kobayashi, Hirokazu Kato, Ayako Kawanishi, Hironobu Sato
Publikováno v:
Journal of Photopolymer Science and Technology. 26:21-26
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d28bb7c4d7ee76345d76792ce0c958a9
https://doi.org/10.2494/photopolymer.26.21
https://doi.org/10.2494/photopolymer.26.21
Autor:
Mitsuhiro Omura, Suigen Kyoh, Yumi Nakajima, Kentaro Matsunaga, Shinya Watanabe, Toshiyuki Sasaki, Tsubasa Imamura, Kazuo Tawarayama
Publikováno v:
Journal of Photopolymer Science and Technology. 24:19-23
EUVL applicability to mass production in 2x nm generations has been proved by recent developments. For 1x nm generations, three major lithography candidates to be applied for mass productions are discussed, quadruple patterning, EUVL single patternin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef660e276ccd90df7f84a884b43f0c58
https://doi.org/10.2494/photopolymer.24.19
https://doi.org/10.2494/photopolymer.24.19
Autor:
Mitsuhiro Omura, Takayuki Ishii, Hisao Tajiri, Hironori Ishii, Tateki Yamane, Kiyotaka Fujise, Kan Uchiyama
Publikováno v:
Digestive Endoscopy. 21:188-191
A 68-year-old man visited our department because of diarrhea and bloody stools. Colonoscopy revealed diverticula scattered in the sigmoid colon with localized mucosal edema and reddening. The mucosa became somewhat rough 9 months later, and had an er
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9692e64af7ca06e03d0de7dfdd9eb0ed
https://doi.org/10.1111/j.1443-1661.2009.00884.x
https://doi.org/10.1111/j.1443-1661.2009.00884.x
Publikováno v:
Digestive Endoscopy. 20:203-206
We report a Helicobacter pylori-negative patient with multiple gastric antral ulcers of unknown etiology and without a history of taking non-steroidal anti-inflammatory drugs (NSAIDs). The patient was a 68-year-old woman, and her serum gastrin and pe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6bba50b9f750211101af8a0eceb2931
https://doi.org/10.1111/j.1443-1661.2008.00808.x
https://doi.org/10.1111/j.1443-1661.2008.00808.x