Zobrazeno 1 - 10
of 42
pro vyhledávání: '"Mitsuhiro Fujita"'
Autor:
Naohiro Tango, Kei Yamamoto, Michihiro Shirakawa, Keiyu Ou, Akiyoshi Goto, Mitsuhiro Fujita, Yasuharu Shiraishi, Toru Fujimori
Publikováno v:
Journal of Photopolymer Science and Technology. 32:445-448
Autor:
Akinori Shibuya, Hidenori Takahashi, Marumo Kazuhiro, Mitsuhiro Fujita, Keiyu O, Takada Akira, Tango Naohiro, Kei Yamamoto, Toru Fujimori
Publikováno v:
Journal of Photopolymer Science and Technology. 31:555-558
Autor:
Goto Akiyoshi, Tango Naohiro, Ryo Nishio, Hidenori Takahashi, Shirakawa Michihiro, Toru Fujimori, Marumo Kazuhiro, Mitsuhiro Fujita, Kei Yamamoto
Publikováno v:
Journal of Photopolymer Science and Technology. 30:367-372
Autor:
Hironori Oka, Tadashi Omatsu, Furutani Hajime, Mitsuhiro Fujita, Shirakawa Michihiro, Toru Fujimori, Sakita Kyohei, Toru Tsuchihashi, Nishiki Fujmaki, Wataru Nihashi
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
For semiconductor device manufacturing, line width roughness (LWR) and defect reduction is one of the most important items to obtain high yield. In this study we described the development of novel high absorption resists for use in extreme ultra viol
Autor:
Wataru Nihashi, Hideaki Tsubaki, Marumo Kazuhiro, Tango Naohiro, Goto Akiyoshi, Kei Yamamoto, Hidenori Takahashi, Furutani Hajime, Mitsuhiro Fujita, Shirakawa Michihiro
Publikováno v:
SPIE Proceedings.
The main challenge in ArF lithography is to reduce cost of ownership (CoO) because increase in multi-patterning process is generally required to obtain a fine pattern. As a consequence, industry strongly requires ArF lithography process with a fast s
Autor:
Ou Keiyu, Nanae Muraki, Takashi Yakushiji, Asakawa Daisuke, Naoya Hatakeyama, Mitsuhiro Fujita, Yasunori Yoneyama, Tadashi Omatsu, Shirakawa Michihiro, Toru Fujimori
Publikováno v:
2016 International Symposium on Semiconductor Manufacturing (ISSM).
Negative tone imaging (NTI) is a method for obtaining a negative-tone reversal pattern by developing with an organic solvent. As NTI process can break-through the resolution limit of a conventional positive-tone development (PTD) process, it has been
Autor:
Asakawa Daisuke, Ou Keiyu, Tadashi Omatsu, Hatakeyama Naoya, Takashi Yakushiji, Shirakawa Michihiro, Mitsuhiro Fujita, Yasunori Yonekuta, Nanae Muraki
Publikováno v:
SPIE Proceedings.
Negative tone imaging (NTI) process is a method for obtaining a negative-tone reversal pattern by developing with an organic solvent. As NTI process can break-through the resolution limit of a conventional positive tone development (PTD) process at s
Autor:
Sohichiro Nakamura, Takeyoshi Kano, Koichi Kawamura, Mitsuhiro Fujita, Takehiro Kasahara, Yasuaki Matsushita, Inoue Masaaki
Publikováno v:
Polymer. 51:4562-4570
A facile approach to the fabrication of ultrathin polymer films on a flat or curved substrate is presented. Polymers with unsaturated pendant groups were spin-coated on a photoinitiator tethered surface, which was then photoirradiated and washed with
Autor:
Furutani Hajime, Kei Yamamoto, Mitsuhiro Fujita, Shirakawa Michihiro, Naoki Inoue, Goto Akiyoshi
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Two approaches which achieve the further evolution of NTD (Negative Tone Development) process are shown in this article. One is ACCEL (Advanced Chemical Contrast Enhancement Layer) process that can improve the lithography performance and the other is
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
In order to improve line width roughness (LWR) of chemically amplified resists (CARs) without trade-offs with other lithographic performances such as exposure latitude (EL) and sensitivity, we investigated effects of the spatial fluctuation of sensit