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pro vyhledávání: '"Mitchel G. N. Haeve"'
Autor:
Wanxing Xu, Mitchel G. N. Haeve, Paul C. Lemaire, Kashish Sharma, Dennis M. Hausmann, Sumit Agarwal
Publikováno v:
Langmuir. 38:652-660
Autor:
Wanxing, Xu, Mitchel G N, Haeve, Paul C, Lemaire, Kashish, Sharma, Dennis M, Hausmann, Sumit, Agarwal
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 38(2)
Small-molecule inhibitors are promising for achieving area-selective atomic layer deposition (ALD) due to their excellent compatibility with industrial processes. In this work, we report on growth inhibition during ALD of Al