Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Mirosław Puźniak"'
Autor:
Mirosław Puźniak, Wojciech Gajewski, Aleksandra Seweryn, Marcin T. Klepka, Bartłomiej S. Witkowski, Marek Godlewski, Robert Mroczyński
Publikováno v:
Materials; Volume 16; Issue 6; Pages: 2539
This work demonstrated the optimization of HiPIMS reactive magnetron sputtering of hafnium oxynitride (HfOxNy) thin films. During the optimization procedure, employing Taguchi orthogonal tables, the parameters of examined dielectric films were explor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a98b3f7e254e5e9d7a14ddf08b18a12e
Autor:
Arkadiusz P. Gertych, Mariusz Zdrojek, Mirosław Puźniak, Wojtek Gajewski, Robert Mroczyński, Marcin Żelechowski, Jan Jamroz
Publikováno v:
Microelectronic Engineering. 228:111332
This study is devoted to the technology and optimization of pulsed-DC reactive magnetron sputtering of hafnium oxynitride (HfOxNy) thin-films. The fabrication process of HfOxNy films was optimized employing the Taguchi orthogonal tables approach lead
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78e45339e14290e894d348076adf9e13
https://doi.org/10.1016/j.mee.2020.111332
https://doi.org/10.1016/j.mee.2020.111332