Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Miranda Un"'
Autor:
Jon Wu, Christophe Fouquet, Guo-Tsai Huang, T. S. Gau, Henk-Jan H. Smilde, Stephen P. Morgan, Maurits van der Schaar, Y. C. Ku, Cathy Wang, Miranda Un, Murat Bozkurt, Andreas Fuchs, Kai-Hsiung Chen, Steffen Meyer, Vincent Tsai, Kaustuve Bhattacharyya, Martin Jacobus Johan Jak, Peter Ten Berge, Michael Kubis, L. G. Terng, Mark van Schijndel, David Hwang, Chih-Ming Ke, Arie Jeffrey Den Boef, Frida Liang, Kevin Cheng
Publikováno v:
SPIE Proceedings.
Aggressive on-product overlay requirements in advanced nodes are setting a superior challenge for the semiconductor industry. This forces the industry to look beyond the traditional way-of-working and invest in several new technologies. Integrated me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e0a8bd347e041751b5b3f6cdef44fa7
https://doi.org/10.1117/12.2011878
https://doi.org/10.1117/12.2011878
Autor:
Tsai-Sheng Gau, Reiner Maria Jungblut, Jon Wu, Lester Wang, Wei-Shun Tzeng, Kai-Hsiung Chen, Miranda Un, Albert Chen, Jim Chen, Spencer Lin, Li-Jui Chen, Guo-Tsai Huang, Ethan Lee
Publikováno v:
SPIE Proceedings.
For the 28 nm node lithographic production steps, the process window for both overlay and CD are becoming increasingly tight. The overlay stability of lithography tools must be at a level of 1-2 nm within the product cycle time, while focus needs to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23d8b76724193ac17cd29cfa73244397
https://doi.org/10.1117/12.879055
https://doi.org/10.1117/12.879055
Autor:
Omer Adam, R. Goossens, Wen-Chuan Wang, Andreas Fuchs, Mir Shahrjerdy, Karel van der Mast, Sophia Wang, Vivien Wang, Y. Cao, T. S. Gao, Jon Wu, Tsung-Chih Chien, X. Xie, W. T. Yang, Sophie Peng, R. C. Peng, H. H. Liu, Noelle Wright, Kaustuve Bhattacharyya, Szu-Yuan Lin, W. Lin, Jacky Huang, Simon Hsieh, Chih-Ming Ke, K. Lin, Maurits van der Schaar, Victor Shih, W. Shao, Chau Hui Wang, Yi-Yin Chen, John Lin, H. J. Lee, Miranda Un
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this work, we propose a new technique for comprehensive scanner matching to fundamentally improve scanner productivity in a Giga fab. The proposal covers matching solutions for both CD and overlay fingerprints among scanners. CD matching strategy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e48363d1cd2a02602e04f67f2ae864ac
https://doi.org/10.1109/asmc.2010.5551449
https://doi.org/10.1109/asmc.2010.5551449