Zobrazeno 1 - 10 of 11 pro vyhledávání: '"Minoru Sugiyama"'
1
Assembly of poly[N-(2-hydroxypropyl)methacrylamide] having cholesteryl moiety as terminal groups
Autor: Ryo Hanamura, Minoru Sugiyama, Kazuo Sugiyama
Publikováno v: Journal of Polymer Science Part A: Polymer Chemistry. 38:3369-3377
Poly[N-(2-hydroxypropyl)methacrylamide]s (PHPMAs) with one pendant cholesteryl moiety at the polymer end and two pendant cholesteryl moieties at both polymer ends as terminal groups (PHPMA-Chol and PHPMA-2Chol) were prepared by the radical polymeriza
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3d73fad855caff1fea76661dde8b3d16
https://doi.org/10.1002/1099-0518(20000915)38:18<3369::aid-pola150>3.0.co
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2
Synthesis of well-defined polystyrene with multi-functional end groups utilizing cyclotriphosphazene
Autor: Tomoyuki Itaya, Sadao Negayama, Minoru Sugiyama, Kenzo Inoue
Publikováno v: Macromolecular Rapid Communications. 18:225-231
Telechelic polystyrenes with five benzyl chloride moieties at the polymer end (PSt-E) were prepared by coupling reaction of polystyryllithium with hexakis(4-chloromethyl-phenoxy)cyclotriphosphazene (4). The coupling reaction occurs almost quantitativ
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::dcdd8808252801489308cc051c44dc77
https://doi.org/10.1002/marc.1997.030180303
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4
Post develop stain defect reduction
Autor: Takuya Kuroda, Minoru Sugiyama, Masahiko Harumoto, Akihiro Hisai
Publikováno v: Advances in Resist Materials and Processing Technology XXV.
This study reports on stain defect reduction on KrF, ArF and Immersion resist system. Stain defects that appear after develop are a common problem with i-line, KrF, ArF and ArF-immersion resists. Last year we reported a reduction of this type of defe
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0b1c2ce5acc91b069f4739b99728e73e
https://doi.org/10.1117/12.772367
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5
Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness
Autor: Stephan Sinkwitz, Manuel Jaramillo, Gene Everad Parris, Masakazu Sanada, Patrick Wong, S. Wang, Minoru Sugiyama
Publikováno v: SPIE Proceedings.
With the introduction of immersion lithography into IC manufacturing for the 45nm node, pattern collapse and line width roughness (LWR) remain critical challenges that can be addressed by implementing formulated surface conditioners. Surface conditio
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::832d9c0613f48e54e810662ac660d6e8
https://doi.org/10.1117/12.712188
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6
Formulated surface conditioners to enhance the non-collapse window and maintain defect control: a bi-functional approach for sub-100nm lithography
Autor: Shawn Cassel, Masakazu Sanada, Minoru Sugiyama, Peng Zhang, Manuel Jaramillo
Publikováno v: SPIE Proceedings.
One key challenge in sub-100 nm lithography is line pattern collapse. Pattern collapse has become an obstacle in device manufacturing processes requiring dense-high aspect ratio resist lines. In addition to pattern collapse, defect control continues
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5c3f28b63863e3bccab40bcb53c1478b
https://doi.org/10.1117/12.656661
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7
Structural characterization of the 16-kDa allergen, RA17, in rice seeds. Prediction of the secondary structure and identification of intramolecular disulfide bridges
Autor: Minoru Sugiyama, Tsukasa Matsuda, Hidehiko Izumi, Ryo Nakamura
Publikováno v: Bioscience, biotechnology, and biochemistry. 63(12)
The 16-kDa rice allergen, RA17, belonging to the alpha-amylase/trypsin inhibitor family was isolated from rice seed and structurally characterized by identifying cystine-containing peptides and predicting the secondary structure and hydrophobic regio
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13ad0a63ca2aeae66b2205677b1daf9b
https://pubmed.ncbi.nlm.nih.gov/10664838
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9
Akademický článek
Cholesteryl moiety terminated amphiphilic polymethacrylates containing nucleic acid bases for drug delivery.
Autor: Kohei Shiraishi, Minoru Sugiyama, Yoji Okamura, Kazuo Sugiyama
Publikováno v: Journal of Applied Polymer Science; Mar2007, Vol. 103 Issue 5, p3064-3075, 12p
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10
Akademický článek
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