Zobrazeno 1 - 10
of 27
pro vyhledávání: '"Minoru Yoshii"'
Autor:
Yasuhiro Oikawa, Minoru Yoshii, Yusuke Ikeda, Hayato Niwa, Takashi Onuma, Kohei Yatabe, Kenji Ishikawa
Publikováno v:
SPIE Proceedings.
Imaging of sound aids the understanding of the acoustical phenomena such as propagation, reflection, and diffraction, which is strongly required for various acoustical applications. The imaging of sound is commonly done by using a microphone array, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9836f67fe60601185802514110927a80
https://doi.org/10.1117/12.2269940
https://doi.org/10.1117/12.2269940
Autor:
Takashi Onuma, Yasuhiro Oikawa, Nachanant Chitanont, Minoru Yoshii, Kenji Ishikawa, Hayato Niwa, Yusuke Ikeda, Kohei Yatabe
Publikováno v:
Optics express. 24(12)
Sound-field imaging, the visualization of spatial and temporal distribution of acoustical properties such as sound pressure, is useful for understanding acoustical phenomena. This study investigated the use of parallel phase-shifting interferometry (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::04c9e1d14d3a32071a0899a35e3e7654
https://pubmed.ncbi.nlm.nih.gov/27410311
https://pubmed.ncbi.nlm.nih.gov/27410311
Autor:
Kiyohara Kosuke, Toyohiko Yatagai, Masato Noguchi, Kazuyuki Ikuo, Takashi Onuma, Motosuke Kiyohara, Hayato Niwa, Minoru Yoshii, Akira Ono, Boaz Jessie Jackin
Publikováno v:
SPIE Proceedings.
A Fizeou interferometer with instantaneous phase-shifting ability using a Wollaston prism is designed. to measure dynamic phase change of objects, a high-speed video camera of 10-5s of shutter speed is used with a pixelated phase-mask of 1024 × 1024
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1ceb32ad8349424985a8a07177ef340
https://doi.org/10.1117/12.2196420
https://doi.org/10.1117/12.2196420
Autor:
Yusuke Ikeda, Yasuhiro Oikawa, Minoru Yoshii, Hayato Niwa, Kenji Ishikawa, Takashi Onuma, Kohei Yatabe
Publikováno v:
The Journal of the Acoustical Society of America. 140:3087-3087
Imaging of a sound field aids understanding of the actual behavior of the field. That is useful for obtaining acoustical spatial characteristics of transducers, materials and noise sources. For high spatial resolution imaging, optical measurement met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8639a5be82665a60bb22537a4c096638
https://doi.org/10.1121/1.4969619
https://doi.org/10.1121/1.4969619
Autor:
Tokuyuki Honda, Akinori Ohkubo, Minoru Yoshii, Miyoko Kawashima, Yuichi Iwasaki, Yasuhiro Kishikawa
Publikováno v:
SPIE Proceedings.
As the resolution of optical lithography is being pushed for 45-nm half-pitch node, there is a growing concern about the printing capability of chemically amplified resists. The chemical amplification involves photoacid diffusion that causes contrast
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17ad0bd24027f99d532affecaf77e015
https://doi.org/10.1117/12.656123
https://doi.org/10.1117/12.656123
Publikováno v:
SPIE Proceedings.
Precise in-situ transmission testing is necessary for evaluation of materials to be used in lithography systems, which use light source at the wavelength of 157 nm. Fluorine (F2) excimer lasers have pulse-to-pulse energy variation (< 9 %, 3 sigma, fr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8a48ea5d990bdd8c4482f60455f1cb3
https://doi.org/10.1117/12.506614
https://doi.org/10.1117/12.506614
Publikováno v:
SPIE Proceedings.
IDEAL (Innovative Double Exposure by Advanced Lithography) has been introduced as a new double exposure technique to realize k 1 equals 0.3 optical lithography. IDEAL uses a rough pattern mask with patterns close to the actual device design and a sim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e42a138dea4bda4f7b0a065be4903fb
https://doi.org/10.1117/12.373298
https://doi.org/10.1117/12.373298
Publikováno v:
SPIE Proceedings.
A new exposure technology called IDEAL (Innovative Double Exposure by Advanced Lithography) which realizes k1 equals 0.3 optical lithography is introduced. In IDEAL exposure method, rough pattern mask and fine pattern mask are used. The rough pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d45423978ec3897cca0d512cdcb97ee
https://doi.org/10.1117/12.360235
https://doi.org/10.1117/12.360235
Publikováno v:
SPIE Proceedings.
The pursuit of ultimate resolution by optical lithography has given rise to many new technologies, such as PSM, oblique illumination etc. In order to realize the benefit of these new technologies in practice, a new exposure technology IDEAL is propos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::170bfd73167f0a5604d5ca57fa9ec514
https://doi.org/10.1117/12.354351
https://doi.org/10.1117/12.354351
Autor:
Minoru Yoshii
Publikováno v:
The Proceedings of Manufacturing Systems Division Conference. 2008:19-20
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6d6cf82609a333bce564fa4e50b08c9
https://doi.org/10.1299/jsmemsd.2008.19
https://doi.org/10.1299/jsmemsd.2008.19