Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Minjong Hong"'
Autor:
Heehwan Lee, Minjong Hong, Min Kang, Hyun Sung Park, Kyusu Ahn, Yongwoo Lee, Yongjo Kim, Woojoo Sim
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Recent advances in machine learning and deep learning have provided an opportunity for improvement in the field of lithography. Compared with the numerical simulation, machine learning/deep learning may provide much faster and more efficient performa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03e18c8f374282d515f7932591228297
https://doi.org/10.1117/12.2551697
https://doi.org/10.1117/12.2551697
Autor:
Matt St. John, Jung-Hoe Choi, Jason Hwang, Young-Chang Kim, Kyoil Koo, Robert Lugg, Seung-Hee Baek, Munhoe Do, Sooryong Lee, Minjong Hong, Daniel F. Beale
Publikováno v:
SPIE Proceedings.
Although the mask pattern created by fine ebeam writing is four times larger than the wafer pattern, the mask proximity effect from ebeam scattering and etch is not negligible. This mask proximity effect causes mask-CD errors and consequently wafer-C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c100417b96496aba4d01314dac56e884
https://doi.org/10.1117/12.793122
https://doi.org/10.1117/12.793122
Autor:
Minjong Hong, Youngchang Kim, Sukjoo Lee, Kyoil Koo, Sooryong Lee, Sungwoon Choi, Woosung Han
Publikováno v:
Proceedings of SPIE.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7b118c2bc0069336cff9be9ee9c27ee
https://doi.org/10.1117/12.801666
https://doi.org/10.1117/12.801666