Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Mineo Miura"'
Publikováno v:
2019 IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC).
A new era in power electronics has been just opened by commercial introduction of silicon carbide (SiC) MOSFETs in a variety of power electronic systems such as power supplies, renewable energy, transportation, heating, robotics, and electric utility
Publikováno v:
Materials Science Forum. :933-936
This paper presents three different structures of Schottky diodes that were fabricated with low Schottky barrier heights. To reduce the forward voltage drop, the introduction of a lower Schttoky barrier is necessary. One of key issues associated with
Autor:
Akira Kamisawa, Keiji Okumura, Yuki Nakano, Noriaki Kawamoto, Takukazu Otsuka, Takashi Nakamura, Mineo Miura
Publikováno v:
Silicon Carbide: Power Devices and Sensors, Volume 2
Silicon carbide (SiC) power devices have been expected as next-generation power-saving devices. We succeeded in fabricating very large area (1 cm 2 ) SiC Schottky barrier diodes (SBDs) with forward current of 300 A by inactivating areas including cry
Autor:
Mineo Miura, Keiji Okumura, Akira Kamisawa, Takashi Nakamura, Noriaki Kawamoto, Takukazu Otsuka, Yuki Nakano
Publikováno v:
physica status solidi (a). 206:2403-2416
Silicon carbide (SiC) power devices have been expected as next-generation power-saving devices. We succeeded in fabricating very large area (1 cm 2 ) SiC Schottky barrier diodes (SBDs) with forward current of 300 A by inactivating areas including cry
Publikováno v:
Solar Energy Materials and Solar Cells. 74:183-193
Spatial distribution of minority-carrier lifetime (τ) in multicrystalline silicon solar cells was investigated. By mapping of τ, a wide distribution in a higher-efficiency cell and a narrow distribution in a lower-efficiency cell was found, respect
Publikováno v:
Materials Science Forum. :659-662
Publikováno v:
SILICON CARBIDE AND RELATED MATERIALS - 2002. :859-862
Publikováno v:
Japanese Journal of Applied Physics. 41:L40-L42
Scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM) of a SiC multiple-pn-junction structure are presented. The structure was grown by atmospheric-pressure chemical vapor deposition using silane, propane and hydro