Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Minako Inukai"'
Autor:
Isamu Funahashi, Kaori Umezawa, Hiroaki Yamada, Minako Inukai, Takuya Nagafuchi, Hiroshi Tomita, Koji Chiba
Publikováno v:
Solid State Phenomena. :69-72
Recently, the control of particles measured in the tens of nanometers has become indispensable for manufacturing semiconductor devices. In sulfuric acid - hydrogen peroxide mixture (SPM) processes, it is increasingly important to reduce particles on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9acaab551d47f8c83b44c5473c94fe53
https://doi.org/10.4028/www.scientific.net/ssp.145-146.69
https://doi.org/10.4028/www.scientific.net/ssp.145-146.69
Autor:
Takehiro Kikuchi, Mikio Yamasaki, Minako Inukai, Hirotaka Nagao, Takao Oi, Noriyuki Suzuki, Akihiro Ueda
Publikováno v:
Angewandte Chemie. 118:3203-3205
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::55c400e8728e6fea19f212864b6393db
https://doi.org/10.1002/ange.200504157
https://doi.org/10.1002/ange.200504157
Publikováno v:
2007 International Symposium on Semiconductor Manufacturing.
Epitaxial growth process strongly depends on the substrate surface cleanliness. In this study, advanced surface cleanness evaluation techniques for 32 nm node and beyond such as light point defects (LPDs) and haze measurements are studied using epita
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e221ac98676b06c8d2f75d4930b5c92
https://doi.org/10.1109/issm.2007.4446888
https://doi.org/10.1109/issm.2007.4446888
Autor:
Hirotaka Nagao, Takehiro Kikuchi, Minako Inukai, Akihiro Ueda, Takao Oi, Noriyuki Suzuki, Mikio Yamasaki
Publikováno v:
Angewandte Chemie; May2006, Vol. 118 Issue 19, p3203-3205, 3p