Zobrazeno 1 - 10
of 85
pro vyhledávání: '"Min Su Cho"'
Autor:
Chan‐Woo Lee, Sun Young Jung, Jeong Ho Ryu, Gyeom Seong Jeon, Ashish Gaur, Min Su Cho, Ghulam Ali, Mingony Kim, Kyung Yoon Chung, Arpan Kumar Nayak, Seoyoon Shin, Jiseok Kwon, Taeseup Song, Tae Ho Shin, HyukSu Han
Publikováno v:
Advanced Science, Vol 11, Iss 46, Pp n/a-n/a (2024)
Abstract Direct formic acid fuel cells (DFAFCs) stand out for portable electronic devices owing to their ease of handling, abundant fuel availability, and high theoretical open circuit potential. However, the practical application of DFAFCs is hinder
Externí odkaz:
https://doaj.org/article/f70d46da24694e8b95577560ff2f88b5
Publikováno v:
EcoMat, Vol 6, Iss 9, Pp n/a-n/a (2024)
Abstract The most feasible technique for producing green hydrogen is water electrolysis. In recent years, there has been significant study conducted on the use of transition metal compounds as electrocatalysts for both anodes and cathodes. Peoples ha
Externí odkaz:
https://doaj.org/article/7492ff6bfc2c4349ae83c911666028dd
Autor:
Sang Ho Lee, Won Douk Jang, Young Jun Yoon, Jae Hwa Seo, Hye Jin Mun, Min Su Cho, Jaewon Jang, Jin-Hyuk Bae, In Man Kang
Publikováno v:
IEEE Access, Vol 9, Pp 50281-50290 (2021)
In this work, a capacitorless one-transistor dynamic random access memory (1T-DRAM) based on a polycrystalline silicon (poly-Si) metal–oxide–semiconductor field-effect transistor was designed and analyzed through a technology computer-aided desig
Externí odkaz:
https://doaj.org/article/7d5735572be84b6daa38b0f88d5b7953
Autor:
Jin Park, Min Su Cho, Sang Ho Lee, Hee Dae An, So Ra Min, Geon Uk Kim, Young Jun Yoon, Jae Hwa Seo, Sin-Hyung Lee, Jaewon Jang, Jin-Hyuk Bae, In Man Kang
Publikováno v:
IEEE Access, Vol 9, Pp 163675-163685 (2021)
In this study, a capacitorless one-transistor dynamic random-access memory (1T-DRAM) based on a polycrystalline silicon nanotube structure with a grain boundary (GB) is designed and analyzed using technology computer-aided design (TCAD) simulation. T
Externí odkaz:
https://doaj.org/article/5ccd72a798794e9ea26e6f74c9a37d5d
Publikováno v:
IEEE Access, Vol 8, Pp 139156-139160 (2020)
To increase the radio-frequency (RF) performance of AlGaN/GaN-based fin-type high electron mobility transistors (HEMTs), a novel T-gate process was developed and applied to fabricate a device with high RF performance. In a single lithography process,
Externí odkaz:
https://doaj.org/article/f7ddc6afc1a5438ba3938f5f2ebfda3c
Autor:
Hee Dae An, Sang Ho Lee, Jin Park, So Ra Min, Geon Uk Kim, Young Jun Yoon, Jae Hwa Seo, Min Su Cho, Jaewon Jang, Jin-Hyuk Bae, Sin-Hyung Lee, In Man Kang
Publikováno v:
Nanomaterials, Vol 12, Iss 19, p 3526 (2022)
In this study, a capacitorless one-transistor dynamic random-access memory (1T-DRAM) cell based on a polycrystalline silicon dual-gate metal-oxide-semiconductor field-effect transistor with a fin-shaped structure was optimized and analyzed using tech
Externí odkaz:
https://doaj.org/article/53113de7cee841eb8e33e3c07ee6fdae
Autor:
Won Douk Jang, Young Jun Yoon, Min Su Cho, Jun Hyeok Jung, Sang Ho Lee, Jaewon Jang, Jin-Hyuk Bae, In Man Kang
Publikováno v:
Micromachines, Vol 10, Iss 11, p 749 (2019)
In this paper, a germanium-based gate-metal-core vertical nanowire tunnel field effect transistor (VNWTFET) has been designed and optimized using the technology computer-aided design (TCAD) simulation. In the proposed structure, by locating the gate-
Externí odkaz:
https://doaj.org/article/19d823c6f17e429faf5604e1ed885e3f
Autor:
Hee-Dae An, Jin-Hyuk Bae, Sin-Hyung Lee, In-Man Kang, So-Ra Min, Sang-Ho Lee, Jin Park, Geon-Uk Kim, Young-Jun Yoon, Jae-Hwa Seo, Min-Su Cho, Jaewon Jang
Publikováno v:
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE. 22:105-114
Autor:
Geon-Uk Kim, Young-Jun Yoon, Jae-Hwa Seo, Min-Su Cho, Sang-Ho Lee, Jin Park, Hee-Dae An, So-Ra Min, In-Man Kang
Publikováno v:
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE. 21:398-405
Autor:
Min-Su Cho, Sang-Ho Lee, Hee-Dae An, Jin Park, So-Ra Min, Geon-Uk Kim, Young-Jun Yoon, Jae-Hwa Seo, In-Man Kang
Publikováno v:
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE. 21:390-397