Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Milesi, Frédéric"'
Autor:
Milési, Frédéric, Coig, Marianne, Lerat, Jean-François, Desrues, Thibaut, Le Perchec, Jérôme, Lanterne, Adeline, Lachal, Laurent, Mazen, Frédéric
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, B 15 October 2017 409:53-59
Autor:
Lerat, Jean-François, Desrues, Thibaut, Le Perchec, Jérôme, Coig, Marianne, Milesi, Frederic, Mazen, Frédéric, Michel, Thomas, Roux, Laurent, Veschetti, Yannick, Dubois, Sébastien
Publikováno v:
In Energy Procedia August 2016 92:697-701
Autor:
Lanterne, Adeline, Gall, Samuel, Veschetti, Yannick, Cabal, Raphaël, Coig, Marianne, Milési, Frédéric, Tauzin, Aurélie
Publikováno v:
In Energy Procedia 2013 38:283-288
Autor:
Prtljaga, Nikola, Navarro-Urrios, Daniel, Marconi, Alessandro, Anopchenko, Aleksei, Colonna, Jean-Philippe, Milesi, Frédéric, Daldosso, Nicola, Jambois, Olivier, Garrido, Blas, Fedeli, Jean-Marc, Pavesi, Lorenzo
Publikováno v:
In Optical Materials 2011 33(7):1083-1085
Autor:
Torregrosa, Frank, Laviron, Cyrille, Milesi, Frédéric, Hernandez, Miguel, Faïk, Hasna, Venturini, Julien
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, B August 2005 237(1-2):18-24
Autor:
Berenguier, B., Ottaviani, Laurent, Biondo, Stéphane, Lazar, Mihai, Milesi, Frédéric, Palais, Olivier, Torregrosa, Frank, Lyoussi, A., Kalinina, Evgenia, Lebedev, A.
Publikováno v:
Materials Science Forum
Materials Science Forum, Trans Tech Publications Inc., 2015, 821-823, pp.644-647. ⟨10.4028/www.scientific.net/MSF.821-823.644⟩
Materials Science Forum, 2015, 821-823, pp.644-647. ⟨10.4028/www.scientific.net/MSF.821-823.644⟩
Materials Science Forum, Trans Tech Publications Inc., 2015, 821-823, pp.644-647. ⟨10.4028/www.scientific.net/MSF.821-823.644⟩
Materials Science Forum, 2015, 821-823, pp.644-647. ⟨10.4028/www.scientific.net/MSF.821-823.644⟩
International audience; Spectral sensitivity measurements versus temperature have been carried out on irradiated SiC p+n photodiodes, fabricated using two different doping processes: Aluminium standard implantation and Boron plasma immersion ion impl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::0450da35a6271629921809dc93ea2caf
https://hal.archives-ouvertes.fr/hal-01391847
https://hal.archives-ouvertes.fr/hal-01391847
Akademický článek
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Autor:
Biondo, Stéphane, Ottaviani, Laurent, Lazar, Mihai, Planson, Dominique, Duchaine, Julian, Le Borgne, V., Khakani, M A, Milesi, Frédéric, Vervisch, Wilfried, Palais, Olivier, Torregrosa, Frank
Publikováno v:
Materials Science Forum
Materials Science Forum, 2012, 717-720, pp.1203-1206. ⟨10.4028/www.scientific.net/MSF.717-720.1203⟩
Materials Science Forum, Trans Tech Publications Inc., 2012, 717-720, pp.1203-1206. ⟨10.4028/www.scientific.net/MSF.717-720.1203⟩
Materials Science Forum, 2012, 717-720, pp.1203-1206. ⟨10.4028/www.scientific.net/MSF.717-720.1203⟩
Materials Science Forum, Trans Tech Publications Inc., 2012, 717-720, pp.1203-1206. ⟨10.4028/www.scientific.net/MSF.717-720.1203⟩
International audience; This paper presents a study of 4H-SiC UV photodetectors based on p + n thin junctions. Two kinds of p + layers have been implemented, aiming at studying the influence of the junction elaborated by the ion implantation process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ea313695cea94c726db61d9207371c18
https://hal.science/hal-02275699/file/rev91.pdf
https://hal.science/hal-02275699/file/rev91.pdf
Autor:
Biondo, Stéphane, Ottaviani, Laurent, Lazar, Mihai, Planson, Dominique, Duchaine, Julian, Le Borgne, Vincent, El Khakani, M.A., Milesi, Frédéric, Vervisch, Wilfried, Palais, Olivier, Torregrosa, Frank
Publikováno v:
Proceedings of the 14th International Conference on Silicon Carbide and Related Materials
CSCRM
CSCRM, Sep 2011, Cleveland, United States
CSCRM
CSCRM, Sep 2011, Cleveland, United States
International audience; This paper presents a study of 4H-SiC UV photodetectors based on p +n thin junctions. Two kinds of p + layers have been implemented, aiming at studying the influence of the junction elaborated by the ion implantation process (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::272aaf5c1918c58691e6cf063b7f6e3b
https://hal.archives-ouvertes.fr/hal-00747301
https://hal.archives-ouvertes.fr/hal-00747301
Autor:
Ottaviani, Laurent, Biondo, Stéphane, Lazar, Mihai, Vervisch, Wilfried, Duchaine, Julian, Milesi, Frédéric, Palais, Olivier, Planson, Dominique, Torregrosa, Frank
Publikováno v:
Proceedings of the 35th Workshop on Compound SemiconductorDevices and Integrated Circuits
WOCSDICE
WOCSDICE, May 2011, Catania, Italy. pp.181
WOCSDICE
WOCSDICE, May 2011, Catania, Italy. pp.181
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a2ac9573c1da88c49694f3cf2cc7e275
https://hal.archives-ouvertes.fr/hal-00661522
https://hal.archives-ouvertes.fr/hal-00661522