Zobrazeno 1 - 10
of 106
pro vyhledávání: '"Milan Tichý"'
Publikováno v:
Materials, Vol 13, Iss 8, p 1797 (2020)
In this paper, the prospects of iron oxide films and their sulfidation for dye-sensitized solar cells (DSSC) are reviewed. Iron oxide thin films were prepared by hollow cathode plasma jet (HCPJ) sputtering, with an admixture of oxygen in the argon wo
Externí odkaz:
https://doaj.org/article/c37ac579a5f24329a993a445f8ab970c
Publikováno v:
Vacuum. 205:111413
Publikováno v:
Vacuum
The Thermionic Vacuum Arc (TVA) is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10−4 Pa. The advantage of this te
Publikováno v:
Materials
Volume 13
Issue 8
Materials, Vol 13, Iss 1797, p 1797 (2020)
Volume 13
Issue 8
Materials, Vol 13, Iss 1797, p 1797 (2020)
In this paper, the prospects of iron oxide films and their sulfidation for dye-sensitized solar cells (DSSC) are reviewed. Iron oxide thin films were prepared by hollow cathode plasma jet (HCPJ) sputtering, with an admixture of oxygen in the argon wo
Publikováno v:
Coatings, Vol 10, Iss 3, p 211 (2020)
This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electro
Publikováno v:
Journal of Alloys and Compounds. 869:159364
The Laser-induced Thermionic Vacuum Arc method was applied to optimize magnesium-silver (Mg:Ag) alloys, which can be potentially used as stable metallic cathodes for optoelectronic devices. Besides lowering the cathode work function given by the magn
Autor:
Gabriel Prodan, Ivan Khalakhan, Milan Tichý, Rodica Vladoiu, R. Perekrestov, Pavel Kudrna, Stanislav Daniš
Publikováno v:
Surface and Coatings Technology. 291:123-129
TiO2 thin films with developed structure were deposited by means of a hollow cathode plasma jet (HCPJ) in a DC regime with a supporting anode. The influence of the plasma temperature on the surface morphology and crystalline structure of the thin fil
Publikováno v:
Journal of Applied Physics. 126:023301
We present a comparatively simple-to-apply in situ diagnostic suitable for determining the dielectric properties of nonconducting and semiconducting thin films during plasma-aided deposition. The method is based on measurement of the impedance spectr
Publikováno v:
Contributions to Plasma Physics. 53:10-15
This article reports on experimental study of the discharge in the low pressure plasma jet sputtering system operated in the continuous DC regime of the discharge excitation. Presented measurements were focused on the description of the working press
Publikováno v:
Contributions to Plasma Physics. 53:63-68
Time-resolved measurements of the plasma parameters are performed in the plume of a cross-field discharge. The plasma potential is measured with a cylindrical Langmuir probe and an emissive probe. The electron temperature and density are measured wit