Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Mikio Yamachika"'
Autor:
Akihiro Hayashi, Raymond J. Hung, Tsutomu Shimokawa, Noboru Yamahara, Haruo Iwasawa, Mikio Yamachika
Publikováno v:
Journal of Photopolymer Science and Technology. 15:693-698
Siloxane/silsesquioxane (SSQ) and fluorocarbon materials have been identified to be relatively transparent at 157nm. While the main stream of material research effort has been focused on the synthesis of fluorocarbon polymers, we have made significan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2090b1e4ecbf2362e8b8835467c0d1c
https://doi.org/10.2494/photopolymer.15.693
https://doi.org/10.2494/photopolymer.15.693
Autor:
Shintaro Yamada, Sungseo Cho, C. Grant Willson, Timo Rager, Bénédicte Mortini, Severine Gally, Mikio Yamachika, Patrick Jean Paniez, Pierre-Olivier Sassoulas, Jeffrey D. Byers, Kyle Patterson
Publikováno v:
Journal of Photopolymer Science and Technology. 12:553-560
This paper reports work toward designing environmentally stable alicyclic polymer-based photoresists for ArF excimer laser lithography. A design concept for improving post-exposure delay stability is suggested in this paper. The polymers described he
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f4516224c426f338b1ef287d8d833e2e
https://doi.org/10.2494/photopolymer.12.553
https://doi.org/10.2494/photopolymer.12.553
Autor:
Makoto Murata, Mikio Yamachika, Takao Miura, Eiichi Kobayashi, Yoshiji Yumoto, Yasutaka Kobayashi
Publikováno v:
Journal of Photopolymer Science and Technology. 5:79-84
A chemically amplified, positive-working resist system based on silylated Polyhydroxystyrene has shown its potential ability for application to the quarter micron lithography. The present paper describes the recent improvement on resist performance a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::677af444481133a39c23ed243cd53aca
https://doi.org/10.2494/photopolymer.5.79
https://doi.org/10.2494/photopolymer.5.79
Autor:
Mikio Yamachika, Brian Osborn, Raymond J. Hung, Shintaro Yamada, Mark Somervell, Colin J. Brodsky, C. Grant Willson, Kyle Patterson, Daniel S. Hall, Jeffrey Byers, Will Conley, Gordana Dukovic
Publikováno v:
Advances in Resist Technology and Processing XVII.
Finding materials that offer the all of the characteristics required of photoresist matrix resin polymers while trying to maintain a high level of transparency at 157 nm is a daunting challenge. To simplify this task, we have broken the design of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3268bfb93092708886ab4a1ee5c1de3
https://doi.org/10.1117/12.388320
https://doi.org/10.1117/12.388320
Publikováno v:
JSR Corporation MarketLine Company Profile. 5/23/2024, p1-28. 28p.
Autor:
Yoshiji Yumoto, Eiichi Kobayashi, Makoto Murata, Yasutaka Kobayashi, Mikio Yamachika, Takao Miura
Publikováno v:
ACS Symposium Series ISBN: 9780841227217
Polymers for Microelectronics: Resists and Dielectrics
Polymers for Microelectronics: Resists and Dielectrics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c55826740b6fe41fa2f13618c9944ac6
https://doi.org/10.1021/bk-1994-0537.ch006
https://doi.org/10.1021/bk-1994-0537.ch006
Publikováno v:
Journal of the Chemical Society, Faraday Transactions. 88:2215
The photocatalytic fixation of CO2 in pyruvic acid to yield malic acid has been achieved in TiO2 microcrystal and CdS particle suspensions using malic enzyme as the catalyst, methyl viologen as the electron mediator and either 2-mercaptoethanol or la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfd2688482767f7b2d002c88655cf5af
https://doi.org/10.1039/ft9928802215
https://doi.org/10.1039/ft9928802215
Publikováno v:
Journal of the Chemical Society, Faraday Transactions. 86:815
PbS microcrystallites ranging from 16 to 40 A were prepared in Nafion; band gaps were determined from absorption spectra. The maximal hypsochromic shift achieved by the size quantization was ca. 1.7 eV. The onset potential of anodic photocurrents at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7497c646f8cfded879eb2e9d5ca058e7
https://doi.org/10.1039/ft9908600815
https://doi.org/10.1039/ft9908600815
Publikováno v:
JSR Corporation MarketLine Company Profile. 6/26/2023, p1-29. 29p.
Publikováno v:
JSR Corporation MarketLine Company Profile. 2/18/2022, p1-22. 22p.