Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Mikio Minonishi"'
Autor:
Katsuo Saio, Yasunori Tanaka, Kazuki Yoshida, Shigeo Morimoto, Yoshihiro Yamaguchi, Yoshihiko Uesugi, Mikio Minonishi
Publikováno v:
QUARTERLY JOURNAL OF THE JAPAN WELDING SOCIETY. 28:311-318
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c1007bcbddf0705c2a622f941afc0b3
https://doi.org/10.2207/qjjws.28.311
https://doi.org/10.2207/qjjws.28.311
Publikováno v:
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C. 71:221-228
For photo resist processing in semiconductor manufacturing, the precise temperature control of wafer has been demanded to realize a more fine device in recent years. However, it is difficult to achieve the precise temperature control by a current waf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::781b2ea808514c7b4efcb6f9c8463ac6
https://doi.org/10.1299/kikaic.71.221
https://doi.org/10.1299/kikaic.71.221
Autor:
Seiji Katayama, Kazuhiro Oka, Mikio Minonishi, Seigo Hiramoto, Akira Matsunawa, Hajime Miyazawa
Publikováno v:
Journal of the Japan Society for Precision Engineering. 59:113-118
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52da9cfc8c8acd4a5700aa578884881e
https://doi.org/10.2493/jjspe.59.113
https://doi.org/10.2493/jjspe.59.113
Autor:
Seigo Hiramoto, Hajime Miyazawa, Kazuhiro Oka, Akira Matsunawa, Seiji Katayama, Mikio Minonishi
Publikováno v:
International Congress on Applications of Lasers & Electro-Optics.
Laser PVD of alumina ceramics on Ni and other various metallic substrates was conducted by using cw Nd:YAG laser heat source to clarify the effect of PVD conditions on deposition rate and hardness of a film as well as the effects of substrate materia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ed2e6335c68b86d94db54b1bfbefcb8
https://doi.org/10.2351/1.5058461
https://doi.org/10.2351/1.5058461
Autor:
Kazuki Yoshida, Yoshihiro Yamaguchi, Katsuo Saio, Mikio Minonishi, Shigeo Morimoto, Yasunori Tanaka, Yoshihiko Uesugi
Publikováno v:
Scopus-Elsevier
An experimental study was conducted on the consumption of hafnium electrodes during oxygen plasma arc cutting (PAC). Hafnium (Hf) is used as a refractory cathode material for thermionic emission in a high-temperature region. The consumption of an Hf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4f05503f707fe8e2cff4aa7613aa5ef3
http://www.scopus.com/inward/record.url?eid=2-s2.0-84864630069&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-84864630069&partnerID=MN8TOARS
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