Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Miki Egami"'
Autor:
Sakayu Shimizu, Chisato Sekikawa, Tatsuo Tsunoda, Hideaki Togashi, Fujio Mizukami, Nobuyuki Horinouchi, Yo-hei Suzuki, Jun Ogawa, Miki Egami, Isao Masuda, Takayuki Y. Nara, Seigo Ono
Publikováno v:
Journal of Molecular Catalysis B: Enzymatic. 68:181-186
Deoxyriboaldolase from Klebsiella pneumonia (KpDERA) was immobilized on interparticle pore type mesoporous silica (IMS), which consists of aggregates of hexagonally close-packed silica nanoparticles. Incubation of the free KpDERA in 300 mM acetaldehy
Autor:
Toh-Ming Lu, Y. Ou, Miki Egami, Gwo-Ching Wang, R. C. Picu, Hiroki Arao, C. Gaire, Akira Nakashima
Publikováno v:
Journal of Porous Materials. 17:11-18
Mechanical properties of porous methyl silsesquioxane samples with dielectric constant 2.4 and 2.0 and a recently developed nanoclustering silica film samples with dielectric constants 2.3 and 2.0 were evaluated using an atomic force microscope based
Autor:
Hiroki Arao, Michio Komatsu, Miki Egami, Ryo Muraguchi, Atsushi Tounai, Akira Nakashima, Kazuaki Inoue
Publikováno v:
Journal of Photopolymer Science and Technology. 12:199-202
Autor:
Miki Egami, Akira Nakashima, Ryoichi Suzuki, Kouichi Hirata, Kenji Ito, Kiminori Sato, Runsheng Yu, Yoshinori Kobayashi, Hiroki Arao, Michio Komatsu, Hisashi Togashi, Toshiyuki Ohdaira
Publikováno v:
MRS Proceedings. 788
We a pplied ellipsometric porosimetry and variable-energy positron annihilation spectroscopy to the pore characterization of spin-on-glass silicon-oxide-backboned porous thin films with different relative dielectric constants between 2.3 and 3.2. It
Autor:
Hiroki Arao, Michio Komatsu, Kenji Ito, Ryoichi Suzuki, C. Sakurai, Kouichi Hirata, Hisashi Togashi, Akira Nakashima, Toshiyuki Ohdaira, Miki Egami, Runsheng Yu, Yoshinori Kobayashi
Publikováno v:
ResearcherID
Scopus-Elsevier
Scopus-Elsevier
Application of porous silicon oxide thin films to nanotechnology is under intensive investigation. Introducing a large amount of nano pores into a silicon oxide matrix is important to develop low-k dielectrics for future ultra-large-scale integrated
Publikováno v:
MRS Proceedings. 565
We studied the effect of pore diameter on the film properties of low-density porous material with special interest in the pore diameter range below 5nm. A novel low-density material, Interpenetrated SOG (IPS), was designed to realize such porous char
Autor:
Kenji Ito, Miki Egami, Kiminori Sato, Runsheng Yu, Yoshinori Kobayashi, Toshikazu Kurihara, Michio Komatsu, Kouichi Hirata, Hiroki Arao, Akira Nakashima
Publikováno v:
Journal of Applied Physics. 98:094307
Positronium time-of-flight spectroscopy with improved stability and signal-to-noise ratio, achieved by a developed off-line digital data analysis, was applied to the characterization of three types of nanoclustering silica porous films with different