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pro vyhledávání: '"Mikhail Ambartsumov"'
Publikováno v:
Вестник Северо-Кавказского федерального университета, Vol 0, Iss 2, Pp 7-12 (2022)
Films of aluminum nitride were grown by the method ofplasma-activated ALD. The impact of duration of plasma exposure stage on the growth rate, composition and microstructures was analyzed. These samples were examined by IR spectroscopy, ellipsometry
Externí odkaz:
https://doaj.org/article/865d528945794516b30a7436d81ca4eb
