Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Mike Xu Ouyang"'
Publikováno v:
Fourth International Conference on Thin Film Physics and Applications.
Sputter deposition process conditions for dielectric metal oxide films was simulated by SIMSPUDTM (Simulation of Sputtered Distributions). Collision cross-sections of Nb and Si were found to be 50 angstroms2 and 55 angstroms2 respectively by pinhole
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c31f850c52a49745473b2d1f3ea027d
https://doi.org/10.1117/12.408294
https://doi.org/10.1117/12.408294
Publikováno v:
Fourth International Conference on Thin Film Physics and Applications.
We report a unique technique to measure the refractive index (n), extinction coefficient (k), and thickness of thin films based on either the reflection or transmission spectra. The method combines a spectrometer, an optical microscope and a video ca
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eabc36a225f0b8df312f80b8cd93503a
https://doi.org/10.1117/12.408415
https://doi.org/10.1117/12.408415