Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Mike Wodjenski"'
Autor:
Joseph Sweeney, Paul Marganski, Robert Kaim, Mike Wodjenski, John Gregg, Sharad Yedave, Steve Sergi, Steve Bishop, David Eldridge, Peng Zou, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko
Publikováno v:
AIP Conference Proceedings.
Xenon difluoride ( XeF 2 ) has been shown to provide many process benefits when used as a daily maintenance recipe for ion implant. Regularly flowing XeF 2 into the ion source cleans the deposits generated by ion source operation. As a result, signif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1e25d7d5bdc9178549652b7a934a998
https://doi.org/10.1063/1.3033633
https://doi.org/10.1063/1.3033633
Autor:
Sharad Yedave, Joe Sweeney, Oleg Byl, Shkelqim Letaj, Mike Wodjenski, Monica Hilgarth, Paul Marganski, Steve Bishop, David Eldridge, Robert Kaim, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko
Publikováno v:
AIP Conference Proceedings.
Since the introduction of XeF2 in‐situ cleaning, its use in production implanters has been mainly focused on cleaning ion sources by flowing the cleaning vapor through the source arc chamber. This has been called “Dynamic” in‐situ cleaning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2f4bef7fe6952c2e1a4a330a1e1278a
https://doi.org/10.1063/1.3033640
https://doi.org/10.1063/1.3033640
Publikováno v:
AIP Conference Proceedings.
Considerable gains in implanter utilization efficiency can be attained with in‐situ cleaning of deposited material, particularly in and around the ion source. Different methods of in‐situ cleaning are described, and we discuss the relative merits
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b476110109d950661f04e90e92c8e3c
https://doi.org/10.1063/1.2401560
https://doi.org/10.1063/1.2401560
Autor:
Dana A. Totir, Shkelqim Letaj, Donald Carruthers, Melissa Petruska, Mackenzie King, Mike Wodjenski
Publikováno v:
ECS Meeting Abstracts. :578-578
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ab3124dbea86ba6f8af90a98db6ec20
https://doi.org/10.1149/ma2012-02/6/578
https://doi.org/10.1149/ma2012-02/6/578