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pro vyhledávání: '"Mike Mishak"'
Autor:
Kazuhito Sasaki, Hiroaki Shimizu, Cheryl Burns, Xiaoming Wu, Brian Bennett, Craig Peterson, Dennis A. Barnes, Chun Chang, Larry Seger, Andy Sobek, Mike Mishak, Leah J. Langsdorf, Larry F. Rhodes, Hideo Hada
Publikováno v:
SPIE Proceedings.
Of all candidate 193 nm photoresist binder resins, transition metal catalyzed vinyl addition cyclic olefin (i.e., norbornene) polymers (PCO) hold the promise of high transparency and excellent etch resistance. In order to access lower molecular weigh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c816d576cf352af29409c3f839be2a2
https://doi.org/10.1117/12.600051
https://doi.org/10.1117/12.600051
