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pro vyhledávání: '"Mike C. Broomfield"'
Autor:
Mike C. Broomfield, MaryAnn Piasecki, Sasha K. Dass, Kevin J. Orvek, John Tremblay, Len Gruber
Publikováno v:
SPIE Proceedings.
There are many commercially available deep-UV resists today that show performance gains above Apex, which has been used in 0.35 micrometers production for some time. In addition there are inorganic antireflection layer (ARL) schemes that can now be u
Autor:
L. J. Elliott, Spooner Terry A, Mike C. Broomfield, S. P. Baranowski, L. Brooke, James R. Lloyd, Larisa Kisselgof
Publikováno v:
SPIE Proceedings.
Attempts to improve the reliability of narrow passivated Al/Cu conductors as defined by the performance in an accelerated electromigration test are reviewed. The results are explained in terms of the effect of thermally induced stress and stress void
Conference
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