Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Mike, Meyer"'
Autor:
Linyong Pang, Lu Sha, Michael Pomerantsev, Ezequiel Vidal Russell, Ryan Pearman, Ali Bouaricha, Bo Su, Mike Meyer, Kechang Wang, Jennefir Ping Digaum, Mariusz Niewczas, Yang Lu, Ming-Chuan Yang, Michael Lee, Bill Baggenstoss, P. Jeffrey Ungar, Aki Fujimura
Publikováno v:
Photomask Technology 2020.
In advanced semiconductor memory manufacturing, mask and lithography are critical for patterning. In this paper we jointly study the benefits of a full-chip, curvilinear, stitchless inverse lithography technology (ILT) with mask-wafer cooptimization
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ee10d415e2a027560f3cff2d34cebac
https://doi.org/10.1117/12.2579729
https://doi.org/10.1117/12.2579729
Publikováno v:
Optical Microlithography XXXIII.
Typical ILT goes through a continuous tone mask to define a greyscale mask for the best process window, followed by a conversion into actual mask geometries, which are typically Manahttanized to be compatible with printing on existing mask writers. O
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce74430aad97b156a712a323b4a9317c
https://doi.org/10.1117/12.2554856
https://doi.org/10.1117/12.2554856
Autor:
Mike Meyer & Friends
This book introduces the fundamentals of sign painting, allowing readers to learn about the tools, materials and techniques needed to create painted signs. All the basics are covered, from choosing and using brushes, paints, mahl sticks, dippers and
Autor:
Aki Fujimura, Michael Pomerantsev, Noriaki Nakayamada, Mariusz Niewczas, Suhas Pillai, Ajay Baranwal, Mike Meyer, Mikael L. Wahlsten, Thang Nguyen
Publikováno v:
Photomask Technology 2019.
Deep learning has an increasing impact on our personal and professional lives. Deep learning has the potential to transform mask, semiconductor and electronics manufacturing. This paper reviews key results from the Center for Deep Learning in Electro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10665e14519b26ce90a7cf1973815349
https://doi.org/10.1117/12.2538440
https://doi.org/10.1117/12.2538440
Autor:
Abhishek Shendre, Linyong Pang, Suhas Pillai, Aki Fujimura, Ajay Baranwal, Mike Meyer, Ryan Pearman, Mariusz Niewczas, Henry Yu, Thang Nguyen
Publikováno v:
Photomask Technology 2019.
Deep learning (DL) is one of the fastest-growing fields in artificial intelligence (AI). While still in its early stages of adoption, DL has already shown it has the potential to make significant changes to the lithography and photomask industries th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9f1d78306f79982323f6cc70cab9e40
https://doi.org/10.1117/12.2538508
https://doi.org/10.1117/12.2538508
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
Deep Learning (DL) is one of the most exciting fields in artificial intelligence (AI) right now. It’s still early days, but DL will completely change the lithography and photomask industry to automate or optimize the efficiency of equipment and pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb05d04f171d7e3ff337ee30dd499b39
https://doi.org/10.1117/12.2538244
https://doi.org/10.1117/12.2538244
Publikováno v:
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2013.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99c607ea2c339cc2b5b1b16d19e6acf1
https://doi.org/10.7873/date.2013.315
https://doi.org/10.7873/date.2013.315
Publikováno v:
DATE
This paper describes an approach to pipelining in high-level synthesis that modifies the control/data flow graph before and after scheduling. This enables the direct re-use of a pre-existing, timing- and area-aware non-pipelined simultaneous schedule
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::930603eb10c216b3a3dccfde0a1d07b7
http://hdl.handle.net/11583/2501070
http://hdl.handle.net/11583/2501070