Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Miguel Ellman"'
Publikováno v:
Applied Surface Science. 258:9370-9373
This work presents the fabrication of hollow-core metallic structures with a complete laser interference lithography (LIL) process. A negative photoresist is used as sacrificial layer. It is exposed to the pattern resulting from the interference of t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22ca289f840c8e1c93de4dea17a710c3
https://doi.org/10.1016/j.apsusc.2012.03.185
https://doi.org/10.1016/j.apsusc.2012.03.185
Autor:
Noemí Pérez, Ainara Rodriguez, Santiago M. Olaizola, Zuobin Wang, Mikel Echeverría, Joan Savall, T. Berthou, I. Ayerdi, Miguel Ellman, Yuri K. Verevkin, Changsi Peng
Publikováno v:
Microelectronic Engineering. 86:937-940
Periodic structures are of increasing interest in many fields such as nanotechnology and biotechnology among others. Laser Interference Lithography (LIL) has been widely studied for the fabrication of periodic structures. However, a LIL tool for the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3094dbf6f42474e2ccbc5a0eecfe9952
https://doi.org/10.1016/j.mee.2008.12.043
https://doi.org/10.1016/j.mee.2008.12.043
Autor:
Ainara Rodriguez, Santiago M. Olaizola, Miguel Ellman, Mikel Echeverría, Changsi Peng, I. Ayerdi, Noemí Pérez, T. Berthou, Yury K. Verevkin, Zuobin Wang
Publikováno v:
Applied Surface Science. 255:5537-5541
High throughput and low cost fabrication techniques in the sub-micrometer scale are attractive for the industry. Laser interference lithography (LIL) is a promising technique that can produce one, two and three-dimensional periodical patterns over la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b07def3fff53f8ebf779024419d02d48
https://doi.org/10.1016/j.apsusc.2008.07.201
https://doi.org/10.1016/j.apsusc.2008.07.201
Autor:
Miguel Ellman, Noemí Pérez, Changsi Peng, Zuobin Wang, I. Ayerdi, Ainara Rodriguez, Ze Ji, Santiago M. Olaizola, Yury K. Verevkin, Jin Zhang, T. Berthou
Publikováno v:
SPIE Proceedings.
Laser interference lithography (LIL) is concerned with the use of interference patterns generated from two or several coherent beams of laser radiation for the structuring of materials. This paper presents the work on the processes based on resists a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0374117fb664505c338c2040d813405b
https://doi.org/10.1117/12.808834
https://doi.org/10.1117/12.808834