Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Midathala Yogesh"'
Autor:
Mohamad G. Moinuddin, Manvendra Chauhan, Midathala Yogesh, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Publikováno v:
ACS Applied Electronic Materials. 3:1996-2004
Given the current need for resist materials for patterning transistors with ultralow nodes, there has been a quest for developing resists with improved performance for nanoscale patterning with goo...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::588894457305d86846ecd66270e9faf6
https://doi.org/10.1021/acsaelm.0c01120
https://doi.org/10.1021/acsaelm.0c01120
Autor:
Shivani Sharma, Manoj Sahani, Mohamad G. Moinuddin, Kenneth E. Gonsalves, Midathala Yogesh, Rudra Kumar, Satinder K. Sharma
Publikováno v:
ACS Applied Nano Materials. 3:8651-8661
Extending the resolution limit of next-generation lithography down to 15 nm or below requires the resist attaining small features, high irradiation sensitivity, and low line edge/width roughness. T...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db7294f3224c3d0b9737aa45a854f390
https://doi.org/10.1021/acsanm.0c01362
https://doi.org/10.1021/acsanm.0c01362
Autor:
Keshaw Ram Aadil, Md. Azahar Ali, Bhuvaneshwari Balasubramaniam, Tandrima Banerjee, Souravi Bardhan, Jayesh Bellare, Snehasis Biswas, Naveen Bunekar, Richa Chaturvedi, Abhishek Chaudhary, Gaurav Chauhan, Mohit Chawla, Antonella V. Dan Córdoba, Sukhen Das, Alokmay Datta, Anca Dinischiotu, Sunil Dutt, Suparna Dutta-Sinha, Nirmal G. R., Mónica C. García, Bidipta Ghosh, Agnivo Gosai, Kishan Gugulothu, Abhishek Gupta, Abhishek Kumar Gupta, Ankur Gupta, Raju Kumar Gupta, Uttam Gupta, James Hartmann, Monsur Islam, Vinay Kishnani, Jan G. Korvink, Ashwani Kumar, Raj Kumar, Rudra Kumar, Yogeenth Kumaresan, Lingeshwar Reddy Kumbam, Genevieve M. Liddle, Marcela Longhi, Dario Mager, Shweta J. Malode, Venkateswarulu Mangili, Miguel Manso Silvan, Sergio O. Martinez-Chapa, Vivek K. Mishra, Jaba Mitra, Joyee Mitra, Mousumi Mitra, Kunal Mondal, Nagaraju Nakka, Ionela Cristina Nica, Yegor Piskarev, Praveen Kumar Poola, Guruprasad Reddy Pulikanti, Nitin Puri, Yuhao Qiang, Darsi Rambabu, Shubham Roy, Ahsana Sadaf, Prateep Singh Sagara, Abhijit Samanta, Deepika Sandil, Konathala Ravi Shankar, Nagaraj P. Shetti, Jun Shintake, Miruna Silvia Stan, null Suchitra, Jazmín Torres, Paula M. Uberman, Jianning Wei, Anshul Yadav, Midathala Yogesh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b04748c1932b00fbbb3f5ac1dad50281
https://doi.org/10.1016/b978-0-12-823033-6.00025-9
https://doi.org/10.1016/b978-0-12-823033-6.00025-9
Autor:
Raj Kumar, Guruprasad Reddy Pulikanti, Konathala Ravi Shankar, Darsi Rambabu, Venkateswarulu Mangili, Lingeshwar Reddy Kumbam, Prateep Singh Sagara, Nagaraju Nakka, Midathala Yogesh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6be569e94d026036bf0c712286a40e75
https://doi.org/10.1016/b978-0-12-823033-6.00007-7
https://doi.org/10.1016/b978-0-12-823033-6.00007-7
Autor:
Midathala Yogesh, Mohamad G. Moinuddin, Lalit D. Khillare, Srinivas Chinthalapalli, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Publikováno v:
Microelectronic Engineering. 260:111795
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f679ee3a0e7a3988ad41f1f505ff47dc
https://doi.org/10.1016/j.mee.2022.111795
https://doi.org/10.1016/j.mee.2022.111795
Autor:
Kenneth E. Gonsalves, Subrata Ghosh, Midathala Yogesh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satinder K. Sharma, Santu Nandi
Publikováno v:
Materials Chemistry Frontiers. 1:1895-1899
While developing a new resist for different lithography applications, starting from high to low nodes, the potential of the resist in successful pattern transfer has been the key for practical applications particularly in semiconductor industries. Al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d9785b41a9b412fb522332f5312f9bf
https://doi.org/10.1039/c7qm00140a
https://doi.org/10.1039/c7qm00140a
Autor:
Kenneth E. Gonsalves, Neha Thakur, Satinder K. Sharma, Santu Nandi, Chullikkattil P. Pradeep, Midathala Yogesh, Pulikanti Guruprasad Reddy, Subrata Ghosh
Publikováno v:
Journal of Micromechanics and Microengineering. 27:125010
The development of new photoresist materials for multi-lithography applications is crucial but a challenging task for semiconductor industries. During the last few decades, given the need for new resists to meet the requirements of semiconductor indu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d857b1cfc066ba5ae65491accc20b633
https://doi.org/10.1088/1361-6439/aa8751
https://doi.org/10.1088/1361-6439/aa8751
Autor:
Neha Thakur, Pulikanti Guruprasad Reddy, Santu Nandi, Midathala Yogesh, Satinder K Sharma, Chullikkattil P Pradeep, Subrata Ghosh, Kenneth E Gonsalves
Publikováno v:
Journal of Micromechanics & Microengineering; Dec2017, Vol. 27 Issue 12, p1-1, 1p