Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Mico Chu"'
Autor:
Pey-Yuan Lee, Jason C. Yee, Mico Chu, Yi-Hung Chen, Thomas Teng, Steven Fu, Hong-Ji Yang, Chi-Shen Lo
Publikováno v:
Semiconductor Manufacturing Technology Workshop, 2002.
The line CD measurement stability has to be evaluated in addition to pitch CD in sub-130 nm node. Regression SPC has been conducted for evaluating CDSEM with the linear growth of the control wafer, that is constructed to minimize the well-know carry-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1669a539819b1b8728ae491232d4cbe1
https://doi.org/10.1109/smtw.2002.1197442
https://doi.org/10.1109/smtw.2002.1197442
Publikováno v:
Semiconductor Manufacturing Technology Workshop, 2002.
In a multiple CD SEM fab, the CD matching and tool stability performance of CD SEM become more and more crucial for new technology generation. In this article, we first address the method to match tools, and also introduce the current monitoring syst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b616146b919bf34fffde13a29e2b904
https://doi.org/10.1109/smtw.2002.1197441
https://doi.org/10.1109/smtw.2002.1197441
Complete monitoring strategy to quantify matching and performance for multiple CDSEM in advanced fab
Publikováno v:
Process and Materials Characterization and Diagnostics in IC Manufacturing.
We will present a complete example that demonstrates daily CD monitor for good CDSEM control, including sampling plan, monitoring procedure, and monitoring and matching data for multiple CDSEM. In addition, we also investigate two methods to address
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3435dd390eb005482eb99147a3fdea3
https://doi.org/10.1117/12.485227
https://doi.org/10.1117/12.485227
Publikováno v:
SPIE Proceedings.
We studied the effect of ArF resist shrinkage under electron bombardment during ebeam metrology and also the effect of resist shrinkage on the after-etch CD. The traditional approach is to reduce the electron energy and dose to minimize resist shrink
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b74547ce037457366bfb46b6dac5235a
https://doi.org/10.1117/12.474260
https://doi.org/10.1117/12.474260
Autor:
Raymond Yip, Yao Ching Ku, Steven Fu, Norman Chen, Dave Castro, Waiman Ng, Mico Chu, Geoffrey T. Anderson, Micheal J. Sherrill
Publikováno v:
SPIE Proceedings.
Three 4X test reticles for 0.15 - 0.18 micrometer lithography are characterized using a critical-dimension scanning electron microscope (CD-SEM). The reticles, which contain metrology cells of isolated and nested lines, are manufactured with an i-lin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed6500ab8884cbcff3f072ca471a3fff
https://doi.org/10.1117/12.373321
https://doi.org/10.1117/12.373321
Autor:
Pey-Yuan Lee, Chi-Shen Lo, Yi-Hung Chen, Hong-Ji Yang, Thomas Teng, Steven Fu, Mico Chu, Jason Yee
Publikováno v:
Semiconductor Manufacturing Technology Workshop, 2002; 2002, p260-263, 4p
Publikováno v:
Semiconductor Manufacturing Technology Workshop, 2002; 2002, p256-259, 4p
Conference
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