Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Michio MINATO"'
Autor:
Michio Minato, Hideo Iwamoto
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:1662-1665
The need to reduce particles in semiconductor equipment and data storage equipment is in high demand. In recent years, barrier and glue layers on shields have been used to reduce particles generated in physical vapor deposition equipment. For this pu
Autor:
Michio MINATO, Yoshio ITOH, Shingo ICHIMURA, Kiyohide KOKUBUN, Masahiro HIRATA, Sonoko TSUKAHARA, Kazuya SAITO, Yoshinao IKEDA, Yoshio SAITO, Kowashi WATANABE, Hiroshi SAEKI, Mitsuhiro MASAKI, Yasuaki SUZUKI, Yukiko TANIUCHI, Takashi NODA, Michio MAENO, Suck Hee BE, Haruo OHKUMA, Masahiro TOSA, Akira KASAHARA, Kazuhiro YOSHIHARA, Seiichiro KANNO, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masaaki NAKAYAMA, Hitoshi NISHIMURA, Kenji SHIRAI, Shinichi KOBAYASHI, Norio OGIWARA, Keiichi OHIRA, Takayuki SATO, Shinichiro MICHIZONO, Shigemi SUGINUMA, Migaku TAKAHASHI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Kazuhiko KOBAYASHI, Masatoshi NOGUCHI, Hidefumi NAKAJIMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Hideo HASEGAWA, Yukio INOKUTI, Kazuhiro SUZUKI, Osamu OHKUBO, Natsuki TAKAHASHI, Masayuki TERAI, Norichika HASEGAWA, Masahiko OKUZAWA, Chuhei OSHIMA, Shigeki OTANI, Kenji ODAKA, Osamu SATOH, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Kenya AKAISHI, Kazuhiro EZAKI, Yusuke KUBOTA, Osamu MOTOJIMA, Masakatsu KITANI, Akira KUROKAWA, Hiroko KAJI, Kiminori KAKITANI, Yoichiro YAGI, Akio YOSHIMORI, Takanori AOKI, Shogo TODA, Kazuaki HAMAJI, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Daisuke TANAKA, Takeshi FUJIWARA, Mituaki MAEDA, Nobuhiko TAKEHARA, Mitsutaka HIKIDA, Yasuhiro IGASAKI, Akishige SATO, Masaru KITAGAWA, Yasunobu KURODA, Eiji KUSANO, Akira KINBARA, Taizo KAWAUCHI, Katsuyuki FUKUTANI, Tatsuo OKANO, Shunji KISHIMOTO, Xiaowei ZHANG, Toyosei KAWASAKI, Daisuke SAKAI, Hiroshi ITOH, Takeo ICHINOKAWA, Toshuu AN, Hiroshi KUBO, Yasuhito GOTOH, Hiroshi TSUJI, Junzo ISHIKAWA, Youiti YAMAMOTO, Toshiaki MIYOKAWA, Nobuaki TAMURA, Tadao MIURA, Touru SUMIYA, Haruko FUJINUMA, Shun-ichiro TANAKA, Hiroyuki YOSHIKI, Teruhiko TSUTSUI, Tetsu OKAMOTO, Seiichi WATANABE, Yukio OKAMOTO, Hiroki KAWADA, Kaoru IJIMA, Seigi MIZUNO, Saburo SHIMIZU, Koh FUWA, Seiji SEKI, Kazunobu HAYAKAWA, Heizo TOKUTAKA, Kazuyuki IWAMOTO, Kikuo FUJIMURA, Toru WATANABE, Satoru KISHIDA, Ken NAKAMURA, Yoshiyuki IGARI, Shinji ISHIDZUKA, Tetsuroh MINE, Tsuyoshi TAKAOKA, Tomohide TAKAMI, Isao KUSUNOKI, Akira HAYAMA, Kazuyoshi IMOTO, Takato HIRAYAMA, Ichiro ARAKAWA, Takashi ADACHI, Koichiro MITSUKE, Makoto SAKURAI, Takashi MOMOSE, Eishuu HAYASAKA, Katsuhiro SAITOU, Katsuya NAGAYAMA, Sin'ya ABE, Kunio OKIMURA, Naoki YASUMARU, Yukiko ABE, Sin-ichi IGARASHI, Yasuo IRIE, Katsumi SUZUKI, Eiji ROKUTA, Tomohiro HAYASHI, Atsushi ITO, Toshio SAKURAI, Masuaki MATSUMOTO, Natsuo TATSUMI, Tadashi ITOYAMA, Masaomi UMEZAWA
Publikováno v:
SHINKU. 41:335-400
Publikováno v:
SHINKU. 40:513-517
Autor:
Michio Minato, Yoshio Itoh
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 121:187-190
Titanium has been proposed as a material for chambers designed for UHV and XHV. As the pumping characteristics of a titanium chamber at room temperature had not been investigated yet, test ducts of 1 m in length and 150 mm in diameter were made by ti
Autor:
Yoshio Itoh, Michio Minato
Publikováno v:
Vacuum. 47:683-686
A vacuum chamber made from TiN coated titanium and a vacuum chamber made from electropolished stainless steel were pumped down with the bakeout process at temperatures of 150 °C, 200 °C, 250 °C and 300 °C. The time (t) dependence of the total pre
Autor:
Michio Minato
Publikováno v:
Metal Finishing. 93:50-54
A high degree of ionization is naturally obtained when using an EB with a high electron current of HCD; therefore, a relatively low bias voltage, such as −30 V, is required to obtain a high-quality film with a smooth surface in HCD ion plating. Man
Autor:
Michio Minato, Yoshio Itoh
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:540-544
Little attention has been paid to metals other than stainless steels and aluminum alloys as materials for ultrahigh vacuum (UHV) and extremely high vacuum (XHV) chambers. Titanium is another candidate material for use in UHV and XHV applications. To
Autor:
Yoshio Itoh, Michio Minato
Publikováno v:
SHINKU. 37:768-771
Titanium is a promising candidate material for vacuum chambers for UHV (ultra high vacuum) and XHV (extreme high vacuum) applications. It has such advantages as light weight, high corrosion resistivity and great mechanical strength. We have studied t
Autor:
Michio Minato, Yoshio Itoh
Publikováno v:
SHINKU. 40:248-250
Autor:
Yoshio Itoh, Michio Minato
Publikováno v:
SHINKU. 37:113-115