Zobrazeno 1 - 10
of 39
pro vyhledávání: '"Michihiro Sano"'
Publikováno v:
Journal of Crystal Growth. 275:e2459-e2465
Polarity-controlled ZnO films with an MgO buffer layer were grown on c -plane sapphire by plasma-assisted molecular beam epitaxy (MBE). The effect of the thickness of the MgO buffer layer on the MBE growth of ZnO was investigated. The growth rate of
Autor:
Kazuhiro Miyamoto, Baoping Zhang, Katsuki Wakatsuki, Hiroyuki Kato, Yusaburo Segawa, Takafumi Yao, Michihiro Sano
Publikováno v:
physica status solidi (b). 241:2825-2829
High-quality Zn-polar ZnO films were grown on metal-organic chemical-vapor deposition (MOCVD) grown ZnO/a-sapphire templates by plasma-assisted molecular beam epitaxy (MBE). Annealing of the MOCVD-ZnO layer in an O 2 atmosphere improved the surface r
Autor:
Z. Vashaei, Kazuhiro Miyamoto, Hang-Ju Ko, I. Yonenaga, Hiroyuki Kato, Takafumi Yao, Michihiro Sano, Meoung Whan Cho, Agus Setiawan
Publikováno v:
Journal of Applied Physics. 96:3763-3768
We have investigated the characteristic of the dislocations in the ZnO layers grown on c sapphire by the plasma-assisted molecular beam epitaxy under the different Zn∕O flux ratios. The ZnO layers were characterized by the transmission electron mic
Publikováno v:
Journal of Applied Physics. 95:5527-5531
The role of hydrogen in the growth and material properties of ZnO films grown at temperature as low as 300 °C by plasma-assisted molecular beam epitaxy with and without hydrogen irradiation was investigated. Results showed that during growth, the su
High-quality ZnO epilayers grown on Zn-face ZnO substrates by plasma-assisted molecular beam epitaxy
Publikováno v:
Journal of Crystal Growth. 265:375-381
High-quality ZnO epilayers have been grown on Zn-face ZnO substrates by plasma-assisted molecular beam epitaxy. With increasing O/Zn flux ratio from the stoichiometric to the O-rich, the growth mode changed from three- to two-dimensional growth and t
Publikováno v:
Journal of Crystal Growth. 265:34-40
High-electron-mobility ZnO epilayers are grown on c -plane sapphire with ZnO/MgO double-buffer layers by plasma-assisted molecular beam epitaxy. Reflection high-energy electron diffraction and transmission electron microscopy analysis showed the grow
Publikováno v:
physica status solidi (b). 241:612-615
High-quality ZnO epilayers have been grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy. With increasing O/Zn flux ratio from the stoichiometric to the O-rich, the growth mode changed from three- to two-dimensional growth and
Publikováno v:
Japanese Journal of Applied Physics. 42:L1050-L1053
The role of surface chemistry in the growth and material properties of ZnO epilayers grown on a-plane sapphire by plasma-assisted molecular beam epitaxy is investigated. The surface chemistry of a-plane sapphire is controlled from O-rich to Al-rich b
Publikováno v:
Japanese Journal of Applied Physics. 42:L1002-L1005
High-quality ZnO films have been grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy. With increasing O/Zn ratio from the stoichiometric to the O-rich flux condition, the growth mode and the surface morphology changed from thre
Publikováno v:
Japanese Journal of Applied Physics. 42:2241-2244
The effect of O/Zn flux ratio on the crystalline quality of ZnO films grown at 700°C by plasma-assisted molecular beam epitaxy was investigated. Zinc beam flux (FZn) was varied from 2.2≤FZn≤8.3 A/s with an O2 flow rate of 3 sccm and RF power of