Zobrazeno 1 - 10
of 43
pro vyhledávání: '"Michiaki Hashimoto"'
Autor:
Toshio Sakamizu, Kei Kasuya, Hiroshi Shiraishi, Michiaki Hashimoto, Tadashi Arai, Sonoko Migitaka
Publikováno v:
Journal of Photopolymer Science and Technology. 14:523-530
We have investigated acid-breakable (AB) resins for chemical-amplification positive resists. The AB resin was synthesized by a co-condensation reaction between an alkali-soluble polyphenol (4, 4′-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]-eth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2eb085f68ddf344717101d2fa2ea224
https://doi.org/10.2494/photopolymer.14.523
https://doi.org/10.2494/photopolymer.14.523
Autor:
Sonoko Migitaka, Michiaki Hashimoto, Fumio Murai, Kyoko Kojima, Hiroshi Shiraishi, Shou-ichi Uchino, Jiro Yamamoto
Publikováno v:
Journal of Photopolymer Science and Technology. 11:555-563
Negative electron beam resists composed of a phenylcarbinol, poly(4-hydroxystyrene) (PHS), and an onium salt have been developed to define patterns below 100-nm. Five phenylcarbinols were evaluated as a precursor of a dissolution inhibitor (PDI) and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2b75389ad091e9287c3a4949912a3ab
https://doi.org/10.2494/photopolymer.11.555
https://doi.org/10.2494/photopolymer.11.555
Publikováno v:
Journal of Photopolymer Science and Technology. 10:625-628
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::509d49c37b9a669aab1db8d738f3ccdf
https://doi.org/10.2494/photopolymer.10.625
https://doi.org/10.2494/photopolymer.10.625
Autor:
Hiroshi Shiraishi, Takumi Ueno, Michiaki Hashimoto, Sonoko Migitaka, Shou-ichi Uchino, Jiro Yamamoto, Kyoko Kojima
Publikováno v:
Journal of Photopolymer Science and Technology. 9:685-691
Chemically amplified negative resists made by utilizing the polarity-change reaction of phenylcarbinol were investigated for electron beam lithography. The resist composed of 1, 3-bis(α-hydroxyisopropyl)benzene (Diol-1), m/p-cresol novolak resin, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d16d9d70634ce98e8f7ee9a48649ae6d
https://doi.org/10.2494/photopolymer.9.685
https://doi.org/10.2494/photopolymer.9.685
Publikováno v:
Journal of Photopolymer Science and Technology. 8:21-28
Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93aa130ad7d6ae93477138b673e38906
https://doi.org/10.2494/photopolymer.8.21
https://doi.org/10.2494/photopolymer.8.21
Autor:
Michiaki Hashimoto, Izumi Watadani, Ryoichi Okuda, Yasuyuki Fujiwara, Hideki Okamoto, Masaru Kimura, Kyosuke Satake, Shiro Morosawa
Publikováno v:
ChemInform. 23
Demethoxycarbonylation of methyl 2,5,-di-tert-butyl-1H-azepine-1-carboxylate using 1,8-diazabicyclo[5.4.0]undec-7-ene gives exclusively two isomers of 3H-azepine derivatives, while methyl 3,6-di-tert-butyl-1H-azepine-1-carboxylate gives a mixture of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb3e431f9a91141fb368ff6ee56ad479
https://doi.org/10.1002/chin.199212211
https://doi.org/10.1002/chin.199212211
Autor:
Ryoichi Okuda, Hideki Okamoto, Michiaki Hashimoto, Kyosuke Satake, Yasuyuki Fujiwara, Shiro Morosawa, Masaru Kimura
Publikováno v:
ChemInform. 25
Demethoxycarbonylation of methyl 2,5-di-tert-butyl-1H-azepine-1-carboxylate using 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU) gave 3H-azepines. Under similar conditions, methyl 3,6-di-tert-butyl-1H-azepine-1-carboxylate gave not only the 3H-azepine but
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed9c6b07b884faecf67d1f2d5b9f2f7c
https://doi.org/10.1002/chin.199447185
https://doi.org/10.1002/chin.199447185
Autor:
Koichi Takaoka, Masaru Kimura, Michiaki Hashimoto, Kyosuke Satake, Shiro Morosawa, Hideki Okamoto
Publikováno v:
ChemInform. 28
A new ring contraction reaction giving pyridine derivatives from 3,6- and 2,5-di-tert-butyl-3H-azepines was observed by a successive treatment with bromine and aqueous K2CO3. A plausible mechanism via azatropilium cation for the rearrangement was dis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2653d58524a935792a0091dc2c0867b8
https://doi.org/10.1002/chin.199718173
https://doi.org/10.1002/chin.199718173
Publikováno v:
Microelectronic Engineering. 18:341-351
An acid-catalyzed etherification of carbinol has been used in the design of an alkali developable, highly sensitive negative resist. The resist consists of diphenylcarbinol (DPC), an acid generator, and a novolak resin shows the best lithographic per
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98e5a773e717cbea5b4e659c4c6f1e75
https://doi.org/10.1016/0167-9317(92)90134-d
https://doi.org/10.1016/0167-9317(92)90134-d
Autor:
Toshio Sakamizu, Hiroshi Shiraishi, Michiaki Hashimoto, Tadashi Arai, Sonoko Migitaka, Kei Kasuya
Publikováno v:
SPIE Proceedings.
We have designed a new chemical amplification (CA) positive resist for 0.1micrometers reticle fabrication. This positive resist consists of an acid-generator, an acid-diffusion controller, and an acid-breakable (AB) resin that can be converted to ini
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc539d46e4849cabb6c355d52a90905f
https://doi.org/10.1117/12.438351
https://doi.org/10.1117/12.438351