Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Michel Touzeau"'
Autor:
Michel Touzeau, J. Bretagne, Jean-Christophe Imbert, P. Pitach, Lionel Teulé-Gay, M. C. Hugon, C. Boisse-Laporte, D Pagnon, L. de Poucques
Publikováno v:
Thin Solid Films. 516:4700-4708
The Ionized Physical Vapour Deposition technique has been developed since 1990 as an improvement of the magnetron sputtering technique to obtain more conformal and dense deposited layers. Amongst the different methods developed to ensure the ionizati
Autor:
Marcel Meško, Jean-Christophe Imbert, D Pagnon, L. de Poucques, Michel Touzeau, Mihai Ganciu, J. Bretagne, Caroline Boisse-Laporte, Petr Vašina
Publikováno v:
Plasma Sources Science and Technology. 16:501-510
This paper is focused on experimental studies of a high power pulsed magnetron discharge stabilized by low current pre-ionization. Time resolved studies were performed for a Cu target by optical emission spectroscopy and electrical measurements for d
Autor:
Ludovic de Poucques, J. Bretagne, Jean-Christophe Imbert, Mihai Ganciu, Lionel Teulé-Gay, Petr Vašina, Michel Touzeau, Carolline Boisse-Laporte
Publikováno v:
Plasma Processes and Polymers. 4:S424-S429
The paper study transport of ionized sputtered particles by means of time and space resolved optical absorption spectroscopy - we concluded that the transport is govern maainly by ambipolar difussion.
Autor:
Michel Touzeau, Ludovic de Poucques, Mihai Ganciu, Caroline Boisse-Laporte, Jean-Christophe Imbert, Lionel Teulé-Gay, J. Bretagne
Publikováno v:
Plasma Sources Science and Technology. 15:661-669
This paper deals with the diagnostics of a high power pulsed magnetron sputtering device (HPPMS). The HPPMS plasma was spatially and temporally characterized in the post-discharge using optical absorption spectroscopy and Langmuir probe time resolved
Autor:
Michel Touzeau, J. Bretagne, Mihai Ganciu, Marcel Meško, L. de Poucques, Caroline Boisse-Laporte, Petr Vašina
Publikováno v:
Europhysics Letters (EPL). 72:390-395
A high-power pulsed-magnetron discharge (several kW/cm2) is described. It operates at pulse duration of the order of few μs, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization
Autor:
Lionel Teulé-Gay, Petr Vašina, J. Bretagne, Jean-Christophe Imbert, Michel Touzeau, Caroline Boisse-Laporte, L. de Poucques
Publikováno v:
Surface and Coatings Technology. 200:800-803
While most of Ionised Physical Vapour Deposition (IPVD) reactors use radio-frequency coils to create additional ionisation, we developed an alternative technique using two microwave antennas to achieve the ionisation of the sputtered vapour. The aim
Autor:
Caroline Boisse-Laporte, M.C. Hugon, J. Bretagne, Dmitry V. Shtansky, O. Voldoire, L. de Poucques, Jean-Christophe Imbert, Lionel Teulé-Gay, Michel Touzeau
Publikováno v:
Surface and Coatings Technology. 200:717-720
Classical magnetron sputtering assisted with an additional ionization device, especially a radio-frequency coil, is a well-known technique to improve the deposited layer qualities. The aim of this work is to characterize the deposition of titanium ba
Autor:
Michel Touzeau, Ludovic de Poucques, Caroline Boisse-Laporte, Jean-Christophe Imbert, Petr Vašina, J. Bretagne, Lionel Teulé-Gay
Publikováno v:
Plasma Sources Science and Technology. 14:321-328
This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy
Autor:
B. Agius, O. Leroy, J. Bretagne, Michel Touzeau, Lionel Teulé-Gay, C. Boisse-Laporte, L. de Poucques, M.C. Hugon
Publikováno v:
Surface and Coatings Technology. 179:176-181
A new type of plasma reactor for thin film deposition has been designed: a magnetron-sputtering device assisted by microwave applicators to ionise the sputtered vapour of the magnetron. Ionizing the vapour has several advantages: improvement of the f
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:192-200
We present an optical absorption diagnostic technique devoted to the simultaneous determination of titanium density and temperature during sputtering of Ti. These measurements were performed in a type of ionized physical vapor deposition reactor, con