Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Michal Zítek"'
Autor:
Martin Rosenthal, Jaakko Julin, Rostislav Daniel, Christian Mitterer, Stefan Spor, Farwah Nahif, Nikolaus Jäger, Michael Meindlhumer, Hynek Hruby, Jozef Keckes, Michal Zítek
Publikováno v:
'Journal of Materials Science & Technology ', vol: 100, pages: 91-100 (2022)
The resistance of wear protective coatings against oxidation is crucial for their use at high temperatures. Here, three nanocomposite AlCr(Si)N coatings with a fixed Al/Cr atomic ratio of 70/30 and a varying Si-content of 0 at.%, 2.5 at.% and 5 at.%
Autor:
František Čech, Michal Zítek
Publikováno v:
Energy Economics. 113:106204
Publikováno v:
Journal of Non-Crystalline Solids. 500:475-481
Amorphous Zr54Cu46 and Zr27Hf27Cu46 thin-film metallic glasses were prepared by non-reactive magnetron co-sputtering of Zr, Hf and Cu in pure argon. Several as-deposited Zr54Cu46 films were post-annealed in high vacuum to create a crystalline thin-fi
Autor:
Stanislav Haviar, Michael Meindlhumer, Jozef Keckes, Tomáš Kozák, Michal Zítek, Ludmila Kučerová, Petr Zeman, Kateřina Opatová
Na tenkých vrstvách materiálu Zr(–Hf)–Cu připravených magnetronovým naprašováním byly měřeny nanoindentace a ohyb mikroskopických nosníků. Detailní analýza naměřených dat a mikroskopických snímků umožnila velmi přesné mě
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16abbd4f67ff31331caa6be3cc995425
http://hdl.handle.net/11025/39830
http://hdl.handle.net/11025/39830
Publikováno v:
Journal of Alloys and Compounds. 739:848-855
Amorphous ternary Zr-Hf-Cu thin-film alloys with glass-like behavior were deposited by non-reactive conventional dc and high-power impulse magnetron co-sputtering using three unbalanced magnetrons equipped with Zr, Hf and Cu targets. The Zr and Hf ta
Publikováno v:
Journal of Alloys and Compounds. 696:1298-1306
Binary Zr–Cu thin-film alloys were prepared by non-reactive conventional dc and impulse magnetron co-sputtering using two unbalanced magnetrons equipped with Zr and Cu targets. The magnetron with the Zr target was operated in a dc regime while the
Amorfní kvaternární tenkovrstvé kovové slitiny Zr–Hf–Al/Si–Cu byly připraveny nereaktivním magnetronovým naprašováním za využití čtyř nevyvážených magnetronů osazených Zr, Hf, Al nebo Si, a Cu terči. Zr, Hf a Al nebo Si ter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b6773c4edb1b88d1615b73ed456982ff
http://hdl.handle.net/11025/30918
http://hdl.handle.net/11025/30918
Publikováno v:
Journal of Alloys and Compounds. 828:154433
Extensive molecular dynamics simulations of the atom-by-atom growth of Zr–Cu films were performed in a wide range of compositions, energies and growth templates. The results are correlated with and used to explain experimental results obtained usin
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 34:021508
This study investigates how the Cu concentration in Zr-Cu-N films affects the films' antibacterial capacity and mechanical properties. Zr-Cu-N films were prepared by reactive magnetron sputtering from composed Zr/Cu targets using a dual magnetron in