Low target power wafer sputtering regime identified during magnetron tantalum barrier physical vapor deposition.

Autor: Stout, Phillip J., Denning, Dean J., Michaelson, Lynne M., Bagchi, Sandeep, Da Zhang, Ventzek, Peter L. G.

Publikováno v: Journal of Applied Physics; 7/15/2005, Vol. 98 Issue 2, p024904, 6p, 2 Black and White Photographs, 1 Diagram, 5 Graphs