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pro vyhledávání: '"Michael William Phaneuf"'
Autor:
Haripriya E. Prakasam, Richard H. Livengood, Ken Guillaume Lagarec, Michael William Phaneuf, Christopher M. Scheffler
Publikováno v:
International Symposium for Testing and Failure Analysis.
This paper provides information on ion beam dose delivery and machining a perfect pattern in an ideal world and summarizes the various beam control limitations of the current generation systems. It discusses conventional and proposed solutions to the
Publikováno v:
International Symposium for Testing and Failure Analysis.
Competitive circuit analysis of Integrated Circuits (ICs) is one of the most challenging types of analysis. It involves multiple complex IC die de-processing/de-layering steps while keeping precise planarity from metal layer to metal layer. Each step
Autor:
Michael William Phaneuf, Jian Li, Kathryn Noll, Peter Carleson, J. David Casey, Clive D. Chandler, Thomas J. Gannon, Alex Krechmer, Nicholas Antoniou, David Monforte, Richard F. Schuman, Michael Megorden, Neil J. Bassom, Chuong Huynh
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2682
Focused ion beam (FIB) methodologies for successfully milling copper (U.S. Patent No. 6,322,672 B1) have been demonstrated. Approaches to milling copper (Cu) are required because standard FIB mill procedures produce rough, uneven cuts that are unsuit