Výsledky vyhledávání - "Michael Waldow"

High-end EUV photomask repairs for 5nm technology and beyond

Autor: Sebastian Vollmar, Katharina Gries, Grizelda Kersteen, Daniel Rhinow, Renzo Capelli, Andreas Krugmann, Walter Pauls, Hubertus Marbach, Alice Di Vincenzo, Ralf Schoenberger, Michael Waldow, Bartholomaeus Szafranek, Horst Schneider, Laura Ahmels, Fan Tu, Andreas Verch

Publikováno v: Photomask Technology 2020.

Scaling trends in the semiconductor industry towards smaller technology nodes and feature sizes are continuing and first consumer products manufactured with the help of EUV technology are already on the market. Major industrial players have introduce

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3512a83b2eef84d8118f35b4afd2e656
https://doi.org/10.1117/12.2572879

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On-Chip Dual-Stream DWDM Eight-Channel-Capable SOI-Based MUX s/DEMUX s With 40-GH z Channel Bandwidth

Autor: S. Papaioannou, Hercules Avramopoulos, Dimitrios Apostolopoulos, Michael Waldow, Caroline Porschatis, Konstantinos Vyrsokinos, D. Fitsios, Nikos Pleros, Andreas Prinzen, George Dabos, G. Giannoulis

Publikováno v: IEEE Photonics Journal. 7:1-10

We demonstrate two 8 × 1 silicon ring resonator (RR)-based multiplexers (MUXs) integrated on the same chip for dual-stream 16-channel multiplexing/ demultiplexing applications. Cascaded second-order RRs equipped with microheaters were integrated on

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fb517bcd6988f7715046620384ba8660
https://doi.org/10.1109/jphot.2014.2381639

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Study on fabrication tolerances of SOI based directional couplers and ring resonators

Autor: Andreas Prinzen, Michael Waldow, Heinrich Kurz, Jens Bolten

Publikováno v: Microelectronic Engineering. 121:51-54

In this study the effect of waveguide shape deviation due to manufacturing tolerances on the performance of lateral directional couplers for ring resonators based on SOI-rib-waveguides is investigated. The effect of deviations of the waveguide width,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::67c4ac0bda0db77a668cd2a11a9d8068
https://doi.org/10.1016/j.mee.2014.03.019

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Silicon-Organic Hybrid Electro-Optical Devices

Publikováno v: IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
IEEE Journal of Selected Topics in Quantum Electronics

Organic materials combined with strongly guiding silicon waveguides open the route to highly efficient electro-optical devices. Modulators based on the so-called silicon-organic hybrid (SOH) platform have only recently shown frequency responses up to

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b79b34b7a1912e2dc9f8b4939464c79b
https://doi.org/10.1109/jstqe.2013.2271846

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Low Power Mach–Zehnder Modulator in Silicon-Organic Hybrid Technology

Autor: Christian Koos, Luca Alloatti, Michael Waldow, Robert Palmer, Raluca Dinu, Dietmar Korn, Jens Bolten, P. C. Schindler, Wolfgang Freude, Juerg Leuthold, Thorsten Wahlbrink, M. Baier

Publikováno v: IEEE Photonics Technology Letters

We report on a silicon-organic hybrid modulator based on a Mach-Zehnder interferometer (MZI) operating at 10 Gbit/s with an energy consumption of 320 fJ/bit. The device consists of a striploaded slot waveguide covered with an electro-optic polymer cl

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7b0e46018021598880895426c09aa7a8
https://doi.org/10.1109/lpt.2013.2260858

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At low costs: Study on optical propagation losses of silicon waveguides fabricated by electron beam lithography

Autor: Heinrich Kurz, Jens Bolten, Thorsten Wahlbrink, Christel Manecke, Michael Waldow

Publikováno v: Microelectronic Engineering. 123:1-3

In this work a novel electron beam lithographic exposure technique suitable for the fabrication of low-loss nanophotonic waveguide structures based on silicon-on-insulator substrate material is presented. This technique utilizes a multi pass exposure

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6189f0c3b02e9ecb7c133d87d4afcaeb
https://doi.org/10.1016/j.mee.2014.03.009

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Recess photomask contact lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches

Autor: Andreas Prinzen, Michael Grøndahl Nielsen, Alain Dereux, Jean-Claude Weeber, Tolga Tekin, Laurent Markey, Filimon Zacharatos, Michael Waldow

Display Omitted A lithography technique capable of printing submicron-sized features inside deep cavities is presented.A so-called recess photomask adapted to the wafer's topography is employed.Based on a standard mask aligner, Recess Photomask Conta

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::787a6d98f3de063684cc05815ed1d070
https://publica.fraunhofer.de/handle/publica/240785

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40 GBd 16QAM signaling at 160 Gb/s in a silicon-organic hybrid modulator

Publikováno v: Journal of Lightwave Technology, 33 (6), 1210-1216

We demonstrate for the first time generation of 16-state quadrature amplitude modulation (16QAM) signals at a symbol rate of 40 GBd using silicon-based modulators. Our devices exploit silicon-organic hybrid (SOH) integration, which combines silicon-o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d6af78a210f1bfcd577f5c93fe19352
https://publikationen.bibliothek.kit.edu/1000051947/3838480

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